Patent
Method for compressing pattern data and data compression processing circuit for radiant beam exposure apparatuses
TLDR
In this paper, the data corresponding to an IC pattern to be depicted on a semiconductor pellet are compressed and stored in a memory, and a plurality of pattern data trains with the same content are compressed into a single pattern data train.Abstract:
The data corresponding to an IC pattern to be depicted on a semiconductor pellet are compressed and stored in a memory. A plurality of pattern data trains with the same content are compressed into a single pattern data train. A code representing the number of the same patterns is added to the head of the single pattern data train. The data element continuously included in the single pattern data train are encoded into another code for data compression. In this coding, the binary "0" is disposed with the same number as the result of subtraction of 2 from the quotient of n (number of the continuous data elements having the same binary value)/2. Following a series of binary "0"s, the binary "1" is disposed for partition. After the partitive binary "1", the binary "0" or "1" is disposed for indicating odd or even number of the data elements. The binary "1" or "0" is inserted between the code for representing the number of the same line patterns and the compressed single pattern data train. The binary inserted is used for correctly coupling adjacent divided patterns together.read more
Citations
More filters
Patent
Pattern data handling system for an electron beam exposure system
Donald W. Berrian,Billy W Ward +1 more
TL;DR: In this paper, a pattern data handling system for an electron beam exposure system was proposed, where figure data conversion is performed simultaneously with irradiation of a workpiece, thereby providing high speed operation.
Patent
Electron beam pattern generation system
TL;DR: In this article, bit pattern data stored in an external memory unit is read out under the control of a microprocessor for being compressed in a data compressing unit (10) and then stacked in a memory unit (30).
Patent
Device comprising a circuit for making a beam exposure system effectively draw a repetitive pattern
TL;DR: In this paper, the authors classify patterns to be drawn by a controlled electron beam producing system or a like system, as on a mask for integrated circuits, into nonrepetitive and repetitive patterns.
Patent
Exposure data forming method, pattern forming method, pattern exposure method and pattern exposure apparatus
TL;DR: In this article, an exposure data organizing method, and an exposure apparatus operable in accordance with the method, organizes exposure data defining a composite pattern to be exposed, which comprises at least one compressed, repeating exposure pattern and a non-compressed, non-repeating exposure pattern each comprising a predefined unit deflection region to which respectively corresponding portions of the exposure data relate.
Patent
Method of efficient compression for measurement data
TL;DR: In this article, a method for compressing measurement data that includes grouping common data elements in common data messages was proposed, and the difference values were compressed using a suitable compression algorithm to provide compressed blocks of data.
References
More filters
Patent
Electron beam exposure system
Robert J. Collier,D. R. Herriott +1 more
TL;DR: In this paper, an electron beam exposure system includes an electron column characterized by a high scanning rate and a limited scan area, where the medium to be exposed constitutes a relatively large area made up of multiple subregions that are to be identically patterned.