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Patent

Method for etching glass

TLDR
In this article, the surface of glass is mirror-finished and immersed into one or more kinds of an etching solns, selected from among HNO3, H2SO4 and HCl, alkaline such as NaOH and NH3, and org. acid solns.
Abstract
PURPOSE:To reduce the haze of ruggedness formed on the surface of glass by carrying out pre-etching with a hydrofluoric acid etching soln. or an etching soln. selected among inorg. acid, alkali and org. acid solns. CONSTITUTION:The surface of glass is mirror-finished and immersed into one or more kinds of an etching solns. selected among one or more kinds of hydrofuloric acid type etching soln selected from among 0.1-65wt.% HF, NH4 and HBF4, one or more kinds of inorg. acids selected among HNO3, H2SO4 and HCl, alkaline such as NaOH and NH3, and org. acids such as acetic acid at room temp. for about 5 min. The surface of the glass is then washed and dried.

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Method for etching glass substrate

TL;DR: In this paper, a method for reducing the thickness of a glass substrate was proposed, which attains a high etching rate and is capable of inhibiting haze generation on the glass substrate surface.