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Patent

Non-volatile ram with integrated compact static ram load configuration

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TLDR
In this article, a non-volatile random access memory (NVRAM) cell of condensed size employs a pair of programmable threshold voltage devices, e.g., floating gate transistors, in which different threshold voltage levels are established in accordance with the data signal levels existing on the data nodes of a flip flop, when the volatile data is stored in the programmable devices.
Abstract
A non-volatile random access memory (NVRAM) cell of condensed size employs a pair of programmable threshold voltage devices, e.g. MNOS (metal nitride oxide semiconductor), SNOS (silicon nitride oxide semiconductor), SONOS (silicon oxide-nitride-oxide semiconductor) or floating gate transistors, in which different threshold voltage levels are established in accordance with the data signal levels existing on the data nodes of a flip flop, when the volatile data is stored in the programmable devices. During recall of the non-volatile stored data to the data nodes of the flip flop, the programmable devices actively conduct current to the data nodes to set the flip flop in the same state that existed when the data was stored. Power is supplied to the flip flop independently of the power supplied to the programmable devices. A single polysilicon conductor forms gates of transistors which connect the programmable devices to the data nodes and the gates of the flip flop transistors. A load device for each data node is integrated in the single polysilicon conductor. A dynamic program inhibit capability is achieved in each programmable device during the store operation, by applying a series of programming signal pulses.

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Citations
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References
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Journal ArticleDOI

The metal-nitride-oxide-silicon (MNOS) transistor—Characteristics and applications

TL;DR: In this article, the authors present a unified approach to the characterization of both stable and variable turn-on voltage MNOS transistors, based on an extensive investigation of charge transport and storage in MNOS structures.
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Nonvolatile direct storage bistable circuit

TL;DR: In this article, a flip-flop is initialized to a state which is a function of the state of the flipflop during the writing mode of operation, which is maintained in the absence of all applied power to the bistable electrical circuit.
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Interlevel insulator for integrated circuit with implanted resistor element in second-level polycrystalline silicon

TL;DR: In this paper, an ion implant step compatible with a self-aligned N-channel silicon-gate process is used to make integrated circuit resistor elements ideally suited for load devices in static MOS RAM cells.
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Static volatile/non-volatile ram cell

TL;DR: In this paper, a volatile/nonvolatile RAM cell (400) employing a bistable multivibrator with non-volatile, alterable threshold capacitors (407, 408) coupled to the output terminals (A, B) thereof to provide backup data storage in a power-down situation.
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Semiconductor integrated circuit vertical geometry impedance element

TL;DR: In this article, a resistive load element comprises a Schottky barrier metal layer formed on the top surface of a doped p-type polycrystalline silicon (polysilicon) plug contacting a surface n+ zone located in a semiconductor body at a major horizontal surface thereof.