Patent
Plasmon enhanced photo processes
Steven C. Hill,Ramesh C. Patel,Delmar L. Barker,Kim A. Baker,Joseph G. Stumpf,Jeffery E. Jacob,John E. Creange +6 more
TLDR
In this article, the plasmon resonance effect was used to enhance the effect of solar energy on a solar responsive electrode of a photochemical battery, and to inhibit the passage of ultraviolet light through a sunscreen.Abstract:
Methods and apparatus provided with selected nanoparticles that exhibit the plasmon resonance effect to enhance photoprocesses. In a first embodiment, such nanoparticles are used in a method of forming an integrated circuit; and in additional embodiments, the nanoparticles are used to increase the catalytic effect of a metal catalyst to increase the rate at which molecules absorb light, to accelerate the reduction of carbon dioxide to formic acid, to accelerate the decomposition of pollutants, and to accelerate the reaction of two reactants to produce a fuel. Additional embodiments utilize the plasmon resonance effect to enhance the effect of solar energy on a solar responsive electrode of a photochemical battery, and to inhibit the passage of ultraviolet light through a sunscreen. Also, in accordance with the present invention, nanoparticles that exhibit the plasmon resonance effect are used to improve a test for a solution for a bio-agent, and to develop fingerprints on a surface.read more
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References
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Toning and solvent washout process for making conductive interconnections
TL;DR: In this paper, two-layer printed circuits with conductive interconnections are prepared by applying a photoadhesive layer to a substrate bearing an electrically conductive circuit pattern.
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Mask structure for forming semiconductor devices, comprising electron-sensitive resist patterns with controlled line profiles
TL;DR: In this article, the authors describe a mask structure comprising a resist pattern having a controlled line profile, for use in defining a predetermined region on and above a substrate, where the substrate with the composite resist is exposed to a beam of electrons to simultaneously define a predetermined pattern in the top and bottom layers of the resist.
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Process for image formation utilizing chemically soluble pigments
TL;DR: In this article, a dot-etched photopolymerizable lithographic film is prepared by exposing imagewise an element consisting essentially of a support and two layers of caustic soluble photopolymers, the upper layer being clear and the lower layer having dispersed therein a chemically soluble pigment, e.g., iron oxide.