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Positive photoresist composition

Nobuhito Fukui, +1 more
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TLDR
A chemical amplifying type positive photoresist composition, which is excellent in various properties, particularly in TDE resistance as well as sensitivity and resolution, and able to suppress unfavorable halation effect without deteriorating profile, is presented in this paper.
Abstract: 
A chemical amplifying type positive photoresist composition, excellent in various properties, particularly in TDE resistance as well as sensitivity and resolution, and able to suppress unfavorable halation effect without deteriorating profile, which comprises (A) a resin which is converted to alkali-soluble from alkali-insoluble or only slightly alkali soluble by the action of an acid, (B) an acid generator, (C) a basic compound and (D) a fluorenone compound represented by the following formula (I): wherein R1, R2, R3, R4, R5, R6, R7 and R8 each independently represent hydrogen, alkyl having 1 to 6 carbon atoms which may be optionally substituted with halogen, halogen or nitro is provided; and a precise fine photoresist pattern can be formed in high precision using the photoresist composition.

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Radiation-sensitive resin composition

Mitsuhito Suwa, +3 more
TL;DR: A radiation sensitive resin composition comprising a fluorine-containing copolymer of hexafluoropropylene, at least one compound selected from the group consisting of unsaturated carboxylic acids and unsaturated carbonyl anhydrides, and an unsaturated compound (B) an acid generating compound which generates an acid upon exposure to radiation; (C) a crosslinkable compound; and (D) an organic solvent.
Patent

Salt and photoresist composition containing the same

Koji Ichikawa, +2 more
TL;DR: In this article, a photoresist composition of a salt represented by the formula (I-CC) and a resin consisting of a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in a polypropylene solution by the action of an acid is presented.
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Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof

Nagahara Tatsuro, +1 more
TL;DR: A positive photosensitive polysilazane composition which comprises: a modified polysilsesquiazane having basic structural units represented by the general formula -[SiR6(NR7)1.5] and/or [SiR63(NR 7)0.5]- in an amount of 0.1 to 100 mol% based on the basic structural unit, and having a number-average molecular weight of 100 to 100,000 as discussed by the authors.
Patent

Polymeren om te worden toegepast in antireflectiedeklagen en werkwijzen ter bereiding hiervan.

Sung-Eun Hong, +3 more
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Polymere de revetement anti-reflecteur et procede de preparation

Sung-Eun Hong, +3 more
TL;DR: In this paper, a polymeres organiques convenant a une utilisation a titre de revetement anti-reflecteur sur des dispositifs semi-conducteurs and se rapporte aux procedes pour les preparer.
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Radiation-sensitive resin composition

Kobayashi Satoshi, +2 more
TL;DR: In this paper, the problem of obtaining a radiation-sensitive compsn. which can form a good pattern and especially has high adhesion property to a substrate and which can easily be removed not by peeling with a peeling liquid but by dissolution peeling method, by incorporating at least an alkali-soluble resin having a specified compd. as one component of the monomers.
Patent

Positive working photosensitive composition

Toshiaki C, +7 more
TL;DR: A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220nm or shorter; comprising a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer as discussed by the authors.