scispace - formally typeset
Patent

Thermal mass flowmeter and mass flow controller, flowmetering system and method

Reads0
Chats0
TLDR
In this article, a flow meter is calibrated using a calibration fluid and the data set is produced by converting the calibration data using process fluid data stored in a data base (200).
Abstract
A flowmeter (100) or mass flow controller (101) used in a manufacturing process with toxic and reactive process fluids. A fluid flow sensor (114) sensesfluid flow. A set point is established based upon predetermined temperature and pressure conditions at which the fluid will be utilized in the process. A valve drive (124) operates a fluid flow valve (126) to the resulting fluid flow rate, this being based upon the sensed flow rate and the set point. A control unit (122) controls the valve drive. The control unit accesses a calibration data set to determine the amount of fluid to be delivered by the fluid flow valve based uponthe sensed flow rate and the set point. This calibration data set is created for the controller over its operational range using a calibration fluid having similar thermodynamic transport properties to a process fluid. The instrument is calibrated using the calibration fluid and the data set is produced by converting the calibration data using process fluid data stored in a data base (200). Accessing the data set stored in the instrument together with routing signals over a communication network (300) permits the instrument to precisely control process fluids without having to introduce external correction factors or other adjustments to the process.

read more

Citations
More filters
Patent

Apparatus and method for depositing materials onto microelectronic workpieces

TL;DR: In this paper, a reaction chamber and a gas distributor are coupled to the inlet to receive a gas flow and a distributor plate including a first surface facing the reaction chamber, a second surface facing a reaction vessel, and a plurality of passageways.
Patent

System and method for a mass flow controller

TL;DR: In this article, a system and method for controlling a mass flow controller to have a constant control loop gain under a variety of different types of fluids and operating conditions, and for configuring the controller for operation with a fluid and/or operating conditions different from that used during a production of the mass flow controllers is presented.
Patent

Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes

TL;DR: In this paper, the authors describe a plasma unit with a first portion or transmissive portion through which the plasma energy can propagate, a second portion or distributor portion having a plurality of outlets, and a chamber in fluid communication with the plurality of outlet.
Patent

Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces

TL;DR: In this paper, the authors present several systems and methods for batch processing of micro-feature workpieces, e.g., semiconductor wafers or the like, such that a first gas flow may be directed by the outlets to flow into at least one of the process spaces between adjacent workpieces along a first vector that is transverse to the direction in which the workpieces are spaced.
Patent

Methods and apparatus for pressure compensation in a mass flow controller

TL;DR: In this article, a method and system for compensating for pressure transients in the pressure environment of a flow path and mass flow controller is presented, and a system and method for reducing or eliminating performance degradations, instabilities, and/or inaccuracies of mass flow controllers caused by changes in the environment.
References
More filters
Patent

Intelligent mass flow controller

TL;DR: An intelligent mass flow controller for controlling the mass flow of gas to a semiconductor processing chamber is described in this article, where a microcontroller which includes a CPU, signal processing and software routines continually monitors the various parameters and provides "on the fly" corrections, as well as providing diagnostics and record retention.
Patent

Electronically controlled flow meter and flow control system

TL;DR: In this paper, a low-friction, low-inertia flexible diaphragm containing a magnet formed as an integral part of the diaphrasm is mounted in a chamber (preferably cylindrical).
Patent

In-line detector system for real-time determination of impurity concentration in a flowing gas stream.

Glenn M. Tom
TL;DR: In this paper, an in-line detector system for real-time detection of impurity concentration in a flowing gas stream is presented, in which purified and unpurified volumes of gas from the gas stream are subjected to concentration sensing.
Patent

Flowmeter fluid composition and temperature correction

TL;DR: In this paper, a method for correcting the flow measurement of a gaseous or liquid fluid of interest for changes in the composition and temperature of that fluid in a flowmeter of the hot element type is disclosed.
Patent

Variable gas volume flow measuring and control methods and apparatus

TL;DR: In this paper, a method and apparatus for measuring gas flow volume in a system (of the kind in which the amount of gas flowing in a duct can vary in response to the variation of area of a variable area orifice in the duct and/or in response of changes in the total pressure of the gas upstream of the orifice) is presented.