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Patent

Tunnel diode load for ultra-fast low power switching circuits

TLDR
In this article, an active multi-terminal switching device such as a transistor in electric series connection with a tunnel diode load discharges, or charges, the output node between tunnel diodes and transistor upon activating, or deactivating, the transistor by appropriate input signals.
Abstract
An active multi-terminal switching device such as a transistor in electric series connection with a tunnel diode load discharges, or charges, the output node between tunnel diode and transistor upon activating, or deactivating, the transistor by appropriate input signals. The negative current-voltage characteristics of the forward biased tunnel diode provides a large load resistance, and thus causes a low current level, during the stationary on-state of the transistor, but it also provides a small load resistance during most of the transient when the transistor is turned off, and thus causes a fast switching speed. A tunnel diode connected between gate and source of an enhancement mode n-channel GaAs junction field effect phototransistor enhances the recovery of the transistor after the activating light beam is switched off.

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Patent

Method for fabricating a semiconductor structure including a metal oxide interface with silicon

TL;DR: In this paper, a method of fabricating a semiconductor structure including the steps of providing a silicon substrate (10) having a surface, forming on the surface of the silicon substrate, by atomic layer deposition (ALD), a seed layer (20;20') characterised by a silicate material and forming, by ALD, one or more layers of a high dielectric constant oxide (40) on the seed layer.
Patent

Semiconductor structure, semiconductor device, communicating device, integrated circuit, and process for fabricating the same

TL;DR: In this article, an amorphous interface layer of silicon oxide is used to dissipate strain and permit the growth of a high quality monocrystalline oxide accommodating buffer layer.
Patent

Structure and method for fabricating an electro-optic system having an electrochromic diffraction grating

TL;DR: In this article, a semiconductor structure for implementing optical beam switching includes a monocrystalline silicon substrate and an amorphous oxide material overlying the mon-coated silicon substrate, and a diffraction grating including an electrochromic portion is optically coupled to the optical source component.
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Semiconductor device including a tunnel effect element

TL;DR: In this article, the first tunnel diode is formed in a first interface region between the first impurity diffusion region and the first channel region when the first preset voltage is applied to the gate electrode.
Patent

Electro-optic structure and process for fabricating same

TL;DR: In this paper, an accommodating buffer layer is proposed for oxide-based electro-optic devices with III-V based photonics and Si circuitry, where waveguides are formed of high quality monocrystalline material atop the buffer layer.
References
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Journal ArticleDOI

High-speed integrated logic with GaAs MESFET's

TL;DR: In this article, the feasibility of using GaAs metal-semiconductor field effect transistors (GaAs MESFETs) in fast switching and high-speed digital integrated circuit applications is demonstrated.