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A. F. Th. Hoekstra
Researcher at University of Chicago
Publications - 4
Citations - 73
A. F. Th. Hoekstra is an academic researcher from University of Chicago. The author has contributed to research in topics: Critical exponent & Metal–insulator transition. The author has an hindex of 3, co-authored 4 publications receiving 67 citations. Previous affiliations of A. F. Th. Hoekstra include VU University Amsterdam & Leiden University.
Papers
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Journal ArticleDOI
Light-induced metal-insulator transition in a switchable mirror.
A. F. Th. Hoekstra,A. F. Th. Hoekstra,A. S. Roy,Thomas Rosenbaum,R.P. Griessen,Rinke J. Wijngaarden,N.J. Koeman +6 more
TL;DR: The finding of persistent photoconductivity under ultraviolet illumination offers an attractive possibility to tune yttrium hydride through the T = 0 metal-insulator transition.
Journal ArticleDOI
Quantum fluctuations and the closing of the Coulomb gap in a correlated insulator.
TL;DR: The "switchable mirror" yttrium hydride is one of the few strongly correlated systems with a continuous Mott-Hubbard metal-insulator transition and the transport from deep in the insulator to the quantum critical point using persistent photoconductivity as a drive parameter is mapped out.
Journal ArticleDOI
Scaling at the Mott-Hubbard metal-insulator transition in yttrium hydride
TL;DR: In this article, a single yttrium hydride thin film is conveniently driven through the T = 0 metal-insulator transition by fine-tuning the charge :carrier density n via persistent photoconductivity at low temperature.
Journal ArticleDOI
High pressure hydrogen loading cell for photoconductivity measurements down to the milliKelvin regime
TL;DR: In this article, a gas loading cell was developed to load rare earth thin film samples with hydrogen at pressures up to 200 bars at room temperature, where a miniature valve closed the gas inlet, after which the cell was suspended from the cold tail of a ^3He flow cryostat into the bore of a 16 T superconducting magnet.