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A. F. Th. Hoekstra

Researcher at University of Chicago

Publications -  4
Citations -  73

A. F. Th. Hoekstra is an academic researcher from University of Chicago. The author has contributed to research in topics: Critical exponent & Metal–insulator transition. The author has an hindex of 3, co-authored 4 publications receiving 67 citations. Previous affiliations of A. F. Th. Hoekstra include VU University Amsterdam & Leiden University.

Papers
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Journal ArticleDOI

Light-induced metal-insulator transition in a switchable mirror.

TL;DR: The finding of persistent photoconductivity under ultraviolet illumination offers an attractive possibility to tune yttrium hydride through the T = 0 metal-insulator transition.
Journal ArticleDOI

Quantum fluctuations and the closing of the Coulomb gap in a correlated insulator.

TL;DR: The "switchable mirror" yttrium hydride is one of the few strongly correlated systems with a continuous Mott-Hubbard metal-insulator transition and the transport from deep in the insulator to the quantum critical point using persistent photoconductivity as a drive parameter is mapped out.
Journal ArticleDOI

Scaling at the Mott-Hubbard metal-insulator transition in yttrium hydride

TL;DR: In this article, a single yttrium hydride thin film is conveniently driven through the T = 0 metal-insulator transition by fine-tuning the charge :carrier density n via persistent photoconductivity at low temperature.
Journal ArticleDOI

High pressure hydrogen loading cell for photoconductivity measurements down to the milliKelvin regime

TL;DR: In this article, a gas loading cell was developed to load rare earth thin film samples with hydrogen at pressures up to 200 bars at room temperature, where a miniature valve closed the gas inlet, after which the cell was suspended from the cold tail of a ^3He flow cryostat into the bore of a 16 T superconducting magnet.