scispace - formally typeset
A

Adrianus I. Aria

Researcher at Cranfield University

Publications -  53
Citations -  1022

Adrianus I. Aria is an academic researcher from Cranfield University. The author has contributed to research in topics: Carbon nanotube & Graphene. The author has an hindex of 16, co-authored 47 publications receiving 697 citations. Previous affiliations of Adrianus I. Aria include California Institute of Technology & University of Cambridge.

Papers
More filters
Journal ArticleDOI

Piezoelectric Materials for Energy Harvesting and Sensing Applications: Roadmap for Future Smart Materials

TL;DR: In this article, a review of recent developments in piezoelectric nanostructured materials, polymers, polymer nanocomposites, and polyamide films for implementation in energy harvesting is presented.
Journal ArticleDOI

Time Evolution of the Wettability of Supported Graphene under Ambient Air Exposure

TL;DR: The finding shows that failure to account for the air exposure time may lead to widely different wettability values and contradicting arguments about the wetting transparency of graphene, suggesting that the classical van der Waals interaction theory alone is insufficient to describe the wettable of graphene.
Journal ArticleDOI

Reversible Tuning of the Wettability of Carbon Nanotube Arrays: The Effect of Ultraviolet/Ozone and Vacuum Pyrolysis Treatments

TL;DR: Results presented herein indeed show that a combination of ultraviolet/ozone and vacuum pyrolysis treatments can be used to vary the surface concentration of these functional groups such that the carbon nanotube array can be repeatedly switched between hydrophilic and hydrophobic.
Journal ArticleDOI

Physicochemical Characteristics and Droplet Impact Dynamics of Superhydrophobic Carbon Nanotube Arrays

TL;DR: The results presented herein may pave a way for the utilization of superhydrophobic carbon nanotube arrays in numerous industrial and practical applications, including inkjet printing, direct injection engines, steam turbines, and microelectronic fabrication.
Journal ArticleDOI

Parameter Space of Atomic Layer Deposition of Ultrathin Oxides on Graphene

TL;DR: It is shown that by extending the precursor residence time, using either a multiple-pulse sequence or a soaking period, ultrathin continuous AlOx films can be achieved directly on graphene using standard H2O and trimethylaluminum precursors even at a high deposition temperature of 200 °C, without the use of surfactants or other additional graphene surface modifications.