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Alain Billard
Researcher at Centre national de la recherche scientifique
Publications - 131
Citations - 1748
Alain Billard is an academic researcher from Centre national de la recherche scientifique. The author has contributed to research in topics: Thin film & Sputtering. The author has an hindex of 20, co-authored 131 publications receiving 1430 citations. Previous affiliations of Alain Billard include Universite de technologie de Belfort-Montbeliard & University of Burgundy.
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Luminescence chronology of Pleistocene loess deposits from Romania: testing methods of age correction for anomalous fading in alkali feldspars
TL;DR: In this article, the IRSL dating method is applied to silt-sized alkali feldspar grains from Upper and Middle Pleistocene loess deposits of southeastern Romania (sites of Tuzla and Giurgiu Malu-Rosu), using both the multiple aliquot g dose technique and the SAR method.
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Properties of TiSiN coatings deposited by hybrid HiPIMS and pulsed-DC magnetron co-sputtering
M. Arab Pour Yazdi,F. Lomello,Jingxian Wang,Jingxian Wang,Jingxian Wang,Frédéric Sanchette,Zhili Dong,Timothy J. White,Yves Wouters,Frédéric Schuster,Alain Billard +10 more
TL;DR: In this article, a hybrid deposition technique where high power impulse (HiPIMS) and pulsed-DC (PDCMS) magnetron co-sputtering was used for Ti and Si deposition respectively in an Ar+N2 atmosphere.
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Structural and mechanical properties of a-C:H and Si doped a-C:H thin films grown by LF-PECVD
C. Chouquet,Guillaume Gerbaud,Michel Bardet,S. Barrat,Alain Billard,Frédéric Sanchette,Cedric Ducros +6 more
TL;DR: Amorphous hydrogenated carbon and Silicon doped a-C:H (Si-DLC) and a-c:H/Si-dLC multilayered films were deposited by low frequency plasma enhanced chemical vapour deposition (LF PECVD) as mentioned in this paper.
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Microstructural, thermal and mechanical behavior of co-sputtered binary Zr-Cu thin film metallic glasses
M. Apreutesei,Philippe Steyer,Lucile Joly-Pottuz,Alain Billard,J. Qiao,S. Cardinal,Frédéric Sanchette,Jean-Marc Pelletier,Claude Esnouf +8 more
TL;DR: In this paper, the authors focused on the opportunity to form a metallic glass coating from the binary Zr-Cu system using a magnetron co-sputtering physical vapor deposition process.
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Zr–Cu thin film metallic glasses: An assessment of the thermal stability and phases’ transformation mechanisms
TL;DR: In this article, the structural stability and crystallization behavior of metallic glass films are investigated by in situ X-ray diffraction (XRD) via heating up to 873 K. The glassy films within the 33.3-89.1% Cu range maintained their amorphous structure at temperatures higher than 550 K.