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Andrey Nikipelov
Researcher at ASML Holding
Publications - 36
Citations - 220
Andrey Nikipelov is an academic researcher from ASML Holding. The author has contributed to research in topics: Extreme ultraviolet lithography & Layer (electronics). The author has an hindex of 9, co-authored 33 publications receiving 182 citations.
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Patent
Beam delivery apparatus and method
Vadim Yevgenyevich Banine,Bartraij Petrus,Van Gorkom Ramon,Luuk J. P. Ament,Pieter Willem Herman De Jager,De Vries Gosse,Donker Rilpho,Wouter Joep Engelen,Frijns Olav,Grimminck Leonardus,Andelko Katalenic,Erik Roelof Loopstra,Han-Kwang Nienhuys,Andrey Nikipelov,Michael Jozef Mathijs Renkens,Franciscus Johannes Joseph Janssen,Borgert Kruizinga +16 more
TL;DR: In this article, the beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or multiple branch radiation beams for provision to one or many tools.
Proceedings ArticleDOI
Advanced particle contamination control in EUV scanners
Mark van de Kerkhof,Tjarko Adriaan Rudolf Van Empel,Michael Lercel,Christophe Smeets,Ferdi van de Wetering,Andrey Nikipelov,Christian Cloin,Andrei Mikhailovich Yakunin,Vadim Banine +8 more
TL;DR: In this paper, the authors proposed a dual-path approach towards zero reticle defectivity: EUV-compatible pellicle or zero particles towards reticle by advanced particle contamination control.
Patent
Lithographic method and system
Andrey Nikipelov,Olav Waldemar Vladimir Frijns,Vries Gosse De,Erik Roelof Loopstra,Vadim Yevgenyevich Banine,Jager Pieter De,Rilpho Ludovicus Donker,Han-Kwang Nienhuys,Borgert Kruizinga,Wouter Joep Engelen,Otger Jan Luiten,Johannes Antonius Gerardus Akkermans,Leonardus Adrianus Gerardus Grimminck,Vladimir Litvinenko +13 more
TL;DR: In this paper, a free electron laser is used to generate EUV radiation and deliver it to a lithographic apparatus which projects the EUV onto the substrate. And a feedback-based control loop is employed to monitor the free-electron laser and adjust operation of the laser accordingly.
Patent
Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane
Andrey Nikipelov,Vadim Yevgenyevich Banine,Jozef Petrus Henricus Benschop,Arjen Boogaard,Florian Didier Albin Dhalluin,Alexey Sergeevich Kuznetsov,Maria Peter,Luigi Scaccabarozzi,Willem Joan Van Der Zande,Pieter-Jan Van Zwol,Andrei Mikhailovich Yakunin +10 more
TL;DR: In this paper, a membrane transmissive to EUV radiation is defined, which may be used as a pellicle or spectral filter in a lithographic apparatus, and the membrane comprises one or more high doped regions wherein said membrane is doped with a dopant concentration greater than 10 17 cm -3, and some or more regions with low (or no) doping.
Proceedings ArticleDOI
Understanding EUV-induced plasma and application to particle contamination control in EUV scanners
Mark van de Kerkhof,Andrei Mikhailovich Yakunin,Vladimir Kvon,Ferdi van de Wetering,Selwyn Cats,Luuk Heijmans,Andrey Nikipelov,Adam Lassise,Vadim Yevgenyevich Banine +8 more
TL;DR: In this paper, the authors focus on the approach of advanced particle contamination control and on the understanding of EUV-induced plasma to control both release and transport of particles within the scanner.