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Bibhu P. Swain
Researcher at National Institute of Technology, Manipur
Publications - 156
Citations - 1531
Bibhu P. Swain is an academic researcher from National Institute of Technology, Manipur. The author has contributed to research in topics: Raman spectroscopy & Thin film. The author has an hindex of 16, co-authored 137 publications receiving 996 citations. Previous affiliations of Bibhu P. Swain include University of Cape Town & Indian Institute of Technology Bombay.
Papers
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Journal ArticleDOI
The analysis of carbon bonding environment in HWCVD deposited a-SiC:H films by XPS and Raman spectroscopy
Bibhu P. Swain,Bibhu P. Swain +1 more
TL;DR: In this article, a-SiC:H network with the variation of C2H2 flow rate and the change in orbital behavior of sp2 and sp3 carbon in the presence of silicon and oxygen atom was analyzed.
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Study of structural and electronic environments of hydrogenated amorphous silicon carbonitride (a-SiCN:H) films deposited by hot wire chemical vapor deposition
Bibhu P. Swain,Nong M. Hwang +1 more
TL;DR: In this article, the effects of the H 2 dilution on structural and chemical bonding of a-SiCN:H has been investigated by Raman and X-ray photoelectron spectroscopy (XPS).
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Electrochemical, bonding network and electrical properties of reduced graphene oxide-Fe2O3 nanocomposite for supercapacitor electrodes applications
TL;DR: In this article, a novel nanocomposite electrode material consisting of reduced graphene oxide (RGO/Fe2O3) has been synthesized using a cost-effective chemical approach for its application in the field of energy storage devices.
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Tribological behaviour and residual stress of electrodeposited Ni/Cu multilayer films on stainless steel substrate
TL;DR: In this paper, X-ray diffraction (XRD) was used to investigate the structure and stress of the Ni/Cu multilayer and wear scars were examined by laser surface profilometry and scanning electron microscopy.
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Multiphase structure of hydrogen diluted a-SiC:H deposited by HWCVD
Bibhu P. Swain,Rajiv O. Dusane +1 more
TL;DR: The structural and optical properties of hydrogenated amorphous silicon carbon (a-SiC:H) thin films, grown from pure SiH4, C2H2 and H2 mixture by hot wire chemical vapor deposition (HWCVD) technique, were studied as discussed by the authors.