Brent D. Keller

TL;DR: These results provide a framework for predicting the range of morphologies available under different solvent vapor conditions, which is important in lithographic applications where precise control of morphology and critical dimensions are essential.

TL;DR: This work shows a flexible solution-based method of preparing thin films with tunable electrical properties from suspensions of ball-milled coals following centrifugation and demonstrates that variable range hopping controls the electrical properties in as-prepared and thermally treated films.

TL;DR: In this paper, the authors demonstrate the necessary process improvements required to achieve sub 1 nm nucleation control by characterization of nucleation domains formed by oxide deposition and demonstrate that large uniform MoS2 areas were achieved by optimizing the effects of various growth process conditions and surface treatments on the ALD.

TL;DR: In this article, the authors demonstrate the necessary process improvements required to achieve sub 1 nm nucleation control by characterization of nucleation domains formed by oxide deposition and demonstrate that large uniform MoS2 areas were achieved by optimizing the effects of various growth process conditions and surface treatments on the ALD.

TL;DR: In this article, molybdenum carbonitride films were deposited using plasma enhanced atomic layer deposition techniques with (tBuN)2(NMe2)2Mo at temperatures ranging from 80 to 300