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Christoph Fuger
Researcher at Vienna University of Technology
Publications - 7
Citations - 281
Christoph Fuger is an academic researcher from Vienna University of Technology. The author has contributed to research in topics: Thin film & Tantalum. The author has an hindex of 4, co-authored 4 publications receiving 178 citations.
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Journal ArticleDOI
Ab initio inspired design of ternary boride thin films.
V. Moraes,Helmut Riedl,Christoph Fuger,Peter Polcik,Hamid Bolvardi,David Holec,Paul H. Mayrhofer +6 more
TL;DR: Investigations on the brittle-ductile behavior of the various diborides reveal, that the metastable structures are more ductile than their stable counterparts (WB2, TcB2, etc.).
Journal ArticleDOI
Substoichiometry and tantalum dependent thermal stability of α-structured W-Ta-B thin films
V. Moraes,Christoph Fuger,Valentina Paneta,Daniel Primetzhofer,Peter Polcik,Hamid Bolvardi,M. Arndt,Helmut Riedl,Paul H. Mayrhofer +8 more
TL;DR: In this paper, the authors combine density functional theory and sophisticated experiments to show that the stability of α-WB2 thin films is basically influenced by point defects such as vacancies present in PVD materials.
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Influence of Tantalum on phase stability and mechanical properties of WB2
Christoph Fuger,V. Moraes,Rainer Hahn,Hamid Bolvardi,Peter Polcik,Helmut Riedl,Paul H. Mayrhofer +6 more
TL;DR: Based on density functional theory, the authors suggested that metastable α-WB2 is a promising candidate combining very high hardness with high toughness, and the addition of Tantalum supports the crystallization of α-structured W1-xTaxB2-z, with only minor reduction in toughness.
Journal ArticleDOI
Anisotropic super-hardness of hexagonal WB2±z thin films
Christoph Fuger,Randy S. Hahn,Ludwig Zauner,T. Wojcik,M. Weiss,Andreas Limbeck,Oliver Hunold,Peter Polcik,Helmut Riedl +8 more
TL;DR: In this paper , an anisotropic elastoplastic behavior in super-hard transition metal diboride-based thin films is reported. But the authors focus on hexagonal WB 2-z , showing that the AlB 2 structure is stabilized by B vacancies exhibiting its energetic minima at sub-stoichiometric WB 1.5 .
Journal ArticleDOI
Influence of Ta on the oxidation resistance of WB2−z coatings
Christoph Fuger,B. Schwartz,T. Wojcik,V. Moraes,Maximilian Weiss,Andreas Limbeck,Chandra Macauley,O. Hunold,Peter Polcik,Daniel Primetzhofer,Peter Felfer,Paul H. Mayrhofer,Helmut Riedl +12 more
TL;DR: In this paper, the oxidation resistance of W1−xTaxB2−z thin films was experimentally investigated at temperatures up to 700 ˚ C. Ta alloying in sputter deposited WB2+z coatings led to decelerated oxide scale growth and a changed growth mode from paralinear to a more linear (but retarded) behavior with increasing Ta content.