Thin Film Materials And Devices.- Thin Film Processes.- Sputtering Phenomena.- Sputtering Systems.- Deposition Of Compound Thin Films.- Structural Control Of Compound Thin Films.- Microfabrication By Sputtering.- Appendix.- Index.

Thin film materials technology : sputtering of compound materials

Optical spectrometry in the diagnosis of ion‐plasma processes

To implement the plasmochemical synthesis of transition metals (Ti, Zr, Mo, W) carbide compounds in a plasma flux of the vacuum arc the discharge carbonaceous working gas is infused. It is shown that the composition of the initial carbonaceous gas defines both the carbon output, and the nature and course of the carbide compounds formation chemical reaction. The composition analysis of the plasma flux in the course of the coating evaporation was carried out by means of the developed emissive spectral analyzer. The result shows that a considerable part of transition metals carbide phases has wide zones of homogeneity within which the change in the carbon content happens without the crystalline grid reorganization. The work reveals and analyzes the factors defining quality of the received carbide compounds (TiC, ZrC, MoC, WC) of refractory metals in a flux of metal plasma of the vacuum arc discharge.

Synthesis of Transition Metals Carbide Compounds in the Vacuum Arc Discharge Plasma

Summary
In this paper we discuss the issues of applying protective coatings on the copper anodes of powerful generator tubes. As a synthesized material due to its high operational properties was chosen titanium carbide obtained by sputtering a titanium cathode in benzene vapors. Scheme of a vacuum arc device used in this work and also the technological processes for the plasmachemical synthesis of coatings on complex shape anodes are described. For a correct choice of the technological parameters it was considered a model of penetration of the plasma flux into the hollow copper anode that was verified by experiments using a setup with a variable cavity diameter. On the emission spectrum of the discharge in the process of coating deposition shown in this work were recorded spectral lines corresponding to the atoms and ions of titanium and carbon ions. We investigated the distribution of elements across the thickness of the formed coating immediately after deposition and after annealing in vacuum, also the X-ray diffraction pattern and a microsection for the obtained titanium carbide coating are presented. As a result of the work it can be noted that the described sequence of technological processes, subject to the control of plasma flux parameters, allows obtaining a high quality protective coating on parts of complex shape.

Plasmachemical synthesis of coatings using a vacuum arc discharge

Vacuum arc discharge, maintained in the vapors of the cathode material, is used for the implementation of plasmachemical synthesis. For the formation of compounds into the plasma flux a working gas is injected. In this work the principle of decomposition of the carbon containing compounds in the low temperature vacuum arc discharge plasma is considered.

http://iopscience.iop.org/article/10.1088/1742-6596/789/1/012029/pdf

Decomposition of the hydrocarbon compounds in the vacuum arc discharge plasma

In this article features of application of the vacuum arc discharge for modification of surfaces are considered. The complication of o this process simulation due to its complexity and tight correlation between different parameters is explained. The mathematical model describing the interaction of a plasma flux with controlling system is offered. The need of cleaning plasma flux from drop fraction in the process of metal coatings deposition is shown. The properties of coatings received by means of a vacuum arc method are considered.

D.K. Kostrin

Papers

Surface Modification by Vacuum Arc Plasma Source