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Journal ArticleDOI

Surface Modification by Vacuum Arc Plasma Source

D.K. Kostrin, +1 more
- 01 Feb 2016 - 
- Vol. 843, pp 278-283
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TLDR
In this paper, features of application of the vacuum arc discharge for modification of surfaces are considered and the complexity of this process simulation due to its complexity and tight correlation between different parameters is explained.
Abstract
In this article features of application of the vacuum arc discharge for modification of surfaces are considered. The complication of o this process simulation due to its complexity and tight correlation between different parameters is explained. The mathematical model describing the interaction of a plasma flux with controlling system is offered. The need of cleaning plasma flux from drop fraction in the process of metal coatings deposition is shown. The properties of coatings received by means of a vacuum arc method are considered.

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Citations
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Thin film materials technology : sputtering of compound materials

TL;DR: In this article, the authors discuss the role of sputtering in thin film materials and devices, and propose a sputtering-based approach for composite thin-film materials and their properties.
Journal ArticleDOI

Synthesis of Transition Metals Carbide Compounds in the Vacuum Arc Discharge Plasma

TL;DR: In this paper, the composition of the initial carbonaceous gas defines both the carbon output, and the nature and course of the carbide compounds formation chemical reaction, and a considerable part of transition metals carbide phases have wide zones of homogeneity within which the change in the carbon content happens without the crystalline grid reorganization.
Journal ArticleDOI

Plasmachemical synthesis of coatings using a vacuum arc discharge

TL;DR: In this paper, the authors discuss the issues of applying protective coatings on the copper anodes of powerful generator tubes and discuss a sequence of technological processes, subject to the control of plasma flux parameters, for obtaining a high quality protective coating on parts of complex shape.
Journal ArticleDOI

Decomposition of the hydrocarbon compounds in the vacuum arc discharge plasma

TL;DR: In this paper, the principle of decomposition of the carbon containing compounds in the low temperature vacuum arc discharge plasma is considered and a working gas is injected for the formation of compounds into the plasma flux.
References
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Cathodic Arcs: From Fractal Spots to Energetic Condensation

André Anders
TL;DR: A Brief History of Cathodic Arc Coating as discussed by the authors, the Physics of Cathode Processes, the Interelectrode Plasma, Cathodic arc Sources, Macroparticles and Macroparticle Filters, Film Deposition by Energetic Condensation, Reactive Deposition.
Book

Handbook of sputter deposition technology : fundamentals and applications for functional thin films, nanomaterials and MEMS

TL;DR: In this article, the authors present a thoroughly updated new edition of the Handbook of Sputtering, which includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology.
Book

Thin film materials technology : sputtering of compound materials

TL;DR: In this article, the authors discuss the role of sputtering in thin film materials and devices, and propose a sputtering-based approach for composite thin-film materials and their properties.
Journal ArticleDOI

Technological Capabilities of Vacuum Arc Plasma Sources

TL;DR: In this article, the authors discuss the possibility of fine controlling gas pressure and reactive gas composition, degree of plasma flux focusing, flux separation from the drop fraction, and flux composition and structure of a coating can be effectively controlled by varying technological parameters.
Journal ArticleDOI

Use of compact spectrometer for plasma emission qualitative analysis

TL;DR: In this article, the authors considered the usage of compact optical spectrometer for plasma emission analysis and showed the capability of specially developed personal computer software to identify specific emission spectral lines.
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