D
Daniel G. Cole
Researcher at Duke University
Publications - 35
Citations - 506
Daniel G. Cole is an academic researcher from Duke University. The author has contributed to research in topics: Model predictive control & Adaptive control. The author has an hindex of 14, co-authored 35 publications receiving 491 citations. Previous affiliations of Daniel G. Cole include Virginia Tech.
Papers
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Journal ArticleDOI
Aberration correction in holographic optical tweezers.
Kurt D. Wulff,Daniel G. Cole,Robert L. Clark,Roberto DiLeonardo,Jonathan Leach,Jon Cooper,Graham M. Gibson,Miles J. Padgett +7 more
TL;DR: By further modifying the hologram design to account for residual aberrations, the fidelity of the focused beams can be significantly improved, quantified by a spot sharpness metric, but the impact this improvement has on the quality of the optical trap depends upon the particle size.
Journal ArticleDOI
Adaptive Compensation of Piezoelectric Sensoriactuators
Daniel G. Cole,Robert L. Clark +1 more
TL;DR: In this article, an adaptive filter is used to estimate the feedthrough capacitance of a piezoelectric sensoriactuator in order to resolve the mechanical response of the piezostructure.
Journal ArticleDOI
Adaptive feedback control of optical jitter using Q-parameterization
TL;DR: Adaptive feedback jitter control using Q-parameterization is experimentally verified on an optical testbed, increasing jitter reduction compared to an H2-optimal fixed-gain controller.
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Phase compensation for feedback control of enclosed sound fields
TL;DR: In this article, a coupled feedback model of the reverberant sound field including in bandwidth transducers is developed to capture accurately the phase characteristics of the system response, particularly at low-frequencies which dominate closed-loop system performance and stability.
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Automated CAD/CAM-based nanolithography using a custom atomic force microscope
TL;DR: An AFM-based anodization lithography on a silicon wafer and subsequent AFM imaging is used to confirm the successful automatic replication of the desired nanoscale patterns to create a custom nanolithographic platform that could be changed and manipulated as per the users specifications and operated easily by anyone.