This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science.

X-Rays and Extreme Ultraviolet Radiation: Principles and Applications

Probing surface and interface morphology with Grazing Incidence Small Angle X-Ray Scattering

https://pure.rug.nl/ws/files/3620572/2001BrabecCPL.pdf

Tracing photoinduced electron transfer process in conjugated polymer/fullerene bulk heterojunctions in real time

It has been known for more than 60 years, and suspected for over 100, that alveolar hypoxia causes pulmonary vasoconstriction by means of mechanisms local to the lung. For the last 20 years, it has been clear that the essential sensor, transduction, and effector mechanisms responsible for hypoxic pulmonary vasoconstriction (HPV) reside in the pulmonary arterial smooth muscle cell. The main focus of this review is the cellular and molecular work performed to clarify these intrinsic mechanisms and to determine how they are facilitated and inhibited by the extrinsic influences of other cells. Because the interaction of intrinsic and extrinsic mechanisms is likely to shape expression of HPV in vivo, we relate results obtained in cells to HPV in more intact preparations, such as intact and isolated lungs and isolated pulmonary vessels. Finally, we evaluate evidence regarding the contribution of HPV to the physiological and pathophysiological processes involved in the transition from fetal to neonatal life, pulmonary gas exchange, high-altitude pulmonary edema, and pulmonary hypertension. Although understanding of HPV has advanced significantly, major areas of ignorance and uncertainty await resolution.

Hypoxic pulmonary vasoconstriction.

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Principles of Lithography

Multilayered structures containing thin (1–12 nm) layers of W or Mo, alternating with C or Si, have been prepared to produce thin cross‐sectional specimens, and direct structural information on the atomic scale has been obtained using an ultrahigh resolution electron microscope. Layer thickness and flatness have been analyzed—the average layer thickness varies by up to 0.6 nm from the average value, and the flatness of the layers depends on the quality of the substrate surface. The degree of crystallinity and crystal orientation within the layers has also been examined. This information should enable more accurate theoretical models to be proposed for the multilayer materials and their x‐ray optical properties. The results for the Mo/Si multilayers suggest a model for their growth when prepared by sputtering.

High‐resolution electron microscopy study of x‐ray multilayer structures

We present a rigorous theoretical treatment of nonspecular x-ray scattering in a distributed imaging system consisting of multilayer-coated reflective optics. The scattering from each optical surface is obtained using a vector scattering theory that incorporates a thin film growth model to provide a realistic description of the interfacial roughness of the multilayer coatings. The theory is validated by comparing calculations based on measured roughness to experimental measurements of nonspecular scattering from a Mo–Si multilayer coating. The propagation of the scattered radiation through the optical system is described in the context of transfer function theory. We find that the effect of nonspecular scattering is to convolve the image with a point spread function that is independent of the coherence of the object illumination. For a typical soft x-ray imaging system, the scattering within the image field from the multilayer coatings is expected to be slightly greater than for single surfaces (as normal...

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Nonspecular x-ray scattering in a multilayer-coated imaging system

The microstructure of Mo/Si multilayers grown by magnetron and ion beam sputter deposition has been characterized over a range of Mo layer thicknesses. We observe an abrupt amorphous-to-crystalline transition in the Mo layers at a thickness of ∼2 nm. The transition exhibits several interesting features including a large decrease in the thickness of the Si-on-Mo interlayer and a significant increase in the roughness of the multilayer. We present an explanation for the transition behavior in terms of a critical thickness for the nucleation of Mo crystallites.

Investigation of the amorphous-to-crystalline transition in Mo/Si multilayers

The effect of elevated temperature on the structural stability and performance of Mo‐Si multilayer mirrors is investigated. Mo‐Si multilayers deposited by magnetron sputtering are annealed at temperatures ranging from 200 to 800 °C. A detailed and consistent picture of the thermally induced changes in the microstructure is obtained using an array of complementary measurement techniques including small‐ and large‐angle x‐ray scattering and high‐resolution electron microscopy. The first significant structural changes are observed at 400 °C, characterized by an increase in the width of the amorphous interlayer regions, as well as the nucleation of microcrystallites of silicide in these regions. At higher temperature the Mo layers transform completely into polycrystalline mixtures of Mo5 Si3 and MoSi2 in both the hexagonal and tetragonal phase. The layers of silicide remain intact but exhibit a structural instability, resulting in severely warped layers surrounded by pockets of amorphous Si and voids. By 800 °C the layered structure is completely destroyed and the composition is predominately tetragonal MoSi2 . The performance of the multilayers as normal‐incidence x‐ray mirrors is measured and correlated with the observed structural modifications. Finally, our results are compared and contrasted with other annealing studies of the Mo‐Si system.

Thermally induced structural modification of Mo‐Si multilayers

Molybdenum–silicon multilayer (ML) x‐ray mirrors have been fabricated using a direct‐current planar magnetron sputtering system. The ML structure has been characterized using x‐ray diffraction and high‐resolution electron microscopy, and the normal incidence x‐ray reflectivity has been measured using synchrotron radiation. A striking dependence of the ML morphology on the sputtering gas pressure is observed, exhibiting a transition from layer growth at lower pressures to columnar growth at higher pressures. Correspondingly, the normal incidence x‐ray reflectivity is found to decrease strongly with increasing gas pressure. By depositing Mo–Si ML at low sputtering gas pressures we have achieved a normal incidence reflectivity as high as 61% at 132 A.

Daniel G. Stearns

Papers

High‐resolution electron microscopy study of x‐ray multilayer structures

Nonspecular x-ray scattering in a multilayer-coated imaging system

Investigation of the amorphous-to-crystalline transition in Mo/Si multilayers

Thermally induced structural modification of Mo‐Si multilayers

Fabrication of high‐reflectance Mo–Si multilayer mirrors by planar‐magnetron sputtering