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Deirdre L. Olynick

Researcher at Lawrence Berkeley National Laboratory

Publications -  99
Citations -  3470

Deirdre L. Olynick is an academic researcher from Lawrence Berkeley National Laboratory. The author has contributed to research in topics: Lithography & Resist. The author has an hindex of 28, co-authored 99 publications receiving 3304 citations. Previous affiliations of Deirdre L. Olynick include University of California, Los Angeles & University of California.

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Patent

Vorrichtung und verfahren für ein raster-kraft mikroskop zur untersuchung und modifikation von oberflächeneigenschaften

TL;DR: In this article, a verfahren zur Untersuchung und Modifikation of Materialoberflachen and oberflachenschaften, welches mit einer solchen Vorrichtung ausfuhrbar ist.
Patent

Lithographic dry development using optical absorption

TL;DR: In this paper, a photo resist layer is exposed to a visible light source in order to remove the resist in the areas of exposure, and the exposure process is carried out for a time sufficient to ablate the exposed resist layer down to the layer below.
Journal ArticleDOI

Polymer–metal coating for high contrast SEM cross sections at the deep nanoscale

TL;DR: A new sample preparation method for high performance cross-sectional secondary electron (SE) imaging, targeting features at the deep nanoscale and into the sub-10 nm regime is presented.
Proceedings ArticleDOI

Heated Dot Magnetic Recording Media - Path to 10 Tdots/in 2

TL;DR: In this article, the nano features were transferred from a template into magnetic thin films by NIL and ion-beam etching (IBE) to achieve areal density of up to 2.0 Tdpsi.