D
Deirdre L. Olynick
Researcher at Lawrence Berkeley National Laboratory
Publications - 99
Citations - 3470
Deirdre L. Olynick is an academic researcher from Lawrence Berkeley National Laboratory. The author has contributed to research in topics: Lithography & Resist. The author has an hindex of 28, co-authored 99 publications receiving 3304 citations. Previous affiliations of Deirdre L. Olynick include University of California, Los Angeles & University of California.
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Patent
Vorrichtung und verfahren für ein raster-kraft mikroskop zur untersuchung und modifikation von oberflächeneigenschaften
Stefan Dr. rer. nat. Kubsky,Deirdre L. Olynick,Peter J. Richmond Schuck,Jan Meijer,Ivo W. Rangelow +4 more
TL;DR: In this article, a verfahren zur Untersuchung und Modifikation of Materialoberflachen and oberflachenschaften, welches mit einer solchen Vorrichtung ausfuhrbar ist.
Patent
Lithographic dry development using optical absorption
TL;DR: In this paper, a photo resist layer is exposed to a visible light source in order to remove the resist in the areas of exposure, and the exposure process is carried out for a time sufficient to ablate the exposed resist layer down to the layer below.
Journal ArticleDOI
Polymer–metal coating for high contrast SEM cross sections at the deep nanoscale
TL;DR: A new sample preparation method for high performance cross-sectional secondary electron (SE) imaging, targeting features at the deep nanoscale and into the sub-10 nm regime is presented.
Proceedings ArticleDOI
Heated Dot Magnetic Recording Media - Path to 10 Tdots/in 2
David S. Kuo,Kim Yang Lee,XiaoMin Yang,Shuaigang Xiao,Yautzong Hsu,Zhaoning Yu,Michael R. Feldbaum,Tim Klemmer,Yukiko Kubota,Jan-Ulrich Thiele,Philip L. Steiner,Koichi Wago,Stefano Dallorto,Deirdre L. Olynick +13 more
TL;DR: In this article, the nano features were transferred from a template into magnetic thin films by NIL and ion-beam etching (IBE) to achieve areal density of up to 2.0 Tdpsi.