D
Deirdre L. Olynick
Researcher at Lawrence Berkeley National Laboratory
Publications - 99
Citations - 3470
Deirdre L. Olynick is an academic researcher from Lawrence Berkeley National Laboratory. The author has contributed to research in topics: Lithography & Resist. The author has an hindex of 28, co-authored 99 publications receiving 3304 citations. Previous affiliations of Deirdre L. Olynick include University of California, Los Angeles & University of California.
Papers
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Proceedings ArticleDOI
Sub-20nm lithography negative tone chemically amplified resists using cross-linker additives
Kulshreshtha Prashant Kumar,Ken Maruyama,Sara Kiani,Scott Dhuey,Pradeep N. Perera,James M. Blackwell,Deirdre L. Olynick,Paul D. Ashby +7 more
TL;DR: In this article, the authors reported the highest resolution for a negative-tone, carbon-based, chemically amplified (CA) resist of 20 nm half-pitch (HP) using both E-beam and EUV exposure systems.
Journal ArticleDOI
Fabrication and performance of nanoscale ultrasmooth programed defects for extreme ultraviolet lithography
Deirdre L. Olynick,F. Salmassi,James Alexander Liddle,Paul B. Mirkarimi,Eberhard Spiller,Sherry L. Baker,Jeff C. Robinson +6 more
TL;DR: In this paper, the authors have developed processes for producing nanoscale programed substrate defects that have applications in areas such as thin film growth, extreme ultraviolet lithography, and defect inspection.
Journal ArticleDOI
Low temperature dry etching of chromium towards control at sub-5 nm dimensions.
Daniel Staaks,XiaoMin Yang,Kim Yang Lee,Scott Dhuey,Simone Sassolini,Ivo W. Rangelow,Deirdre L. Olynick +6 more
TL;DR: This work investigates how temperature can be used to control chromium etching using chlorine/oxygen gas mixtures and finds that etching temperature can manipulate the surface chemistry.
Journal ArticleDOI
Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects
Patrick P. Naulleau,Kenneth A. Goldberg,Erik H. Anderson,Jeffrey Bokor,Eric M. Gullikson,Bruce Harteneck,Keith Jackson,Deirdre L. Olynick,Farhad Salmassi,Sherry L. Baker,Paul B. Mirkarimi,Eberhard Spiller,Christopher C. Walton,Guojing Zhang +13 more
TL;DR: In this article, the authors report on tests performed to lithographically characterize the effectiveness of defect smoothing and to verify defect printability models, showing that normally printable 50 nm substrate defects are rendered nonprintable through the smoothing process.
Journal ArticleDOI
Selective laser ablation in resists and block copolymers for high resolution lithographic patterning
Deirdre L. Olynick,Pradeep N. Perera,Adam M. Schwartzberg,Prashant Kulshreshta,Dimas G. de Oteyza,Nathan D. Jarnagin,Cliff Henderson,Zhiwei Sun,Zhiwei Sun,Ilja Gunkel,Ilja Gunkel,Thomas P. Russell,Thomas P. Russell,Matthias Budden,Ivo W. Rangelow +14 more
TL;DR: In this article, the authors demonstrate selective laser ablation processes as a means to create a block copolymer derived lithographic pattern through the selective removal of one block, where the P2VP is infiltrated with platinum Pt.