D
Dong Uk Lee
Researcher at Hanyang University
Publications - 70
Citations - 5553
Dong Uk Lee is an academic researcher from Hanyang University. The author has contributed to research in topics: Non-volatile memory & Layer (electronics). The author has an hindex of 13, co-authored 69 publications receiving 4744 citations. Previous affiliations of Dong Uk Lee include SK Hynix.
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Journal ArticleDOI
Iodide management in formamidinium-lead-halide–based perovskite layers for efficient solar cells
Woon Seok Yang,Byung-wook Park,Eui Hyuk Jung,Nam Joong Jeon,Young Chan Kim,Dong Uk Lee,Seong Sik Shin,Jangwon Seo,Eun Kyu Kim,Jun Hong Noh,Sang Il Seok +10 more
TL;DR: The introduction of additional iodide ions into the organic cation solution, which is used to form the perovskite layers through an intramolecular exchanging process, decreases the concentration of deep-level defects, enabling the fabrication of PSCs with a certified power conversion efficiency.
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Highly improved Sb2S3 sensitized-inorganic-organic heterojunction solar cells and quantification of traps by deep-level transient spectroscopy
TL;DR: In this article, the light harvesting Sb2S3 surface on mesoporous-TiO2 in inorganic-organic heterojunction solar cells is sulfurized with thioacetamide (TA).
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Floating gated silicon-on-insulator nonvolatile memory devices with Au nanoparticles embedded in SiO1.3N insulators by digital sputtering method
TL;DR: In this article, a floating gated silicon-on-insulator nonvolatile memory with Au nanoparticles embedded in SiO1.3N insulators was fabricated and a significant threshold voltage shift was obtained due to the charging effects of Au particles and memory window was larger than 2.5V.
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The effect of oxygen partial pressure on band gap modulation of Ga2O3 grown by pulsed laser deposition
TL;DR: In this article, the influence of oxygen partial pressure and annealing on the properties of thin films of β-Ga2O3 grown by pulsed laser deposition were studied.
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Toward negligible charge loss in charge injection memories based on vertically integrated 2D heterostructures
TL;DR: In this article, a semiconducting-tungsten-disulfide-channel-based memory device is created by sandwiching high-density-of-states multi-layered graphene as a carrier-confining layer between tunnel barriers of hexagonal boron nitride (hBN) and silicon dioxide.