E. Kravtchinskaia

TL;DR: In this article, the structural, optical, electrical and physical properties of amorphous carbon deposited from the filtered plasma stream of a vacuum arc were investigated, and the tetrahedral coordination of the material was confirmed by measurements of stress and plasmon energy as a function of ion energy.

TL;DR: Amorphous carbon films prepared by filtered cathodic arc deposition have been studied by electron-energy-loss spectroscopy as discussed by the authors, and it is shown nitrogen concentrations in the film of up to 30at.% can be controllably introduced.

TL;DR: In this article, the relation between compressive stress, the substrate temperature and the microstructure of amorphous carbon films deposited from the plasma stream of a cathodic vacuum arc with a curved magnetic filter was investigated.

TL;DR: In this article, the properties of amorphous carbon films prepared by filtered cathodic arc deposition were measured using electron diffraction and electron energy loss spectroscopy, and it was found that levels of these substances of up to 1% do not change the tetrahedral structure of the carbon network.

TL;DR: Tetrahedral amorphous carbon (ta-C) is a new semiconductor which is able to accept dopants and shows photoconductivity as mentioned in this paper, it may be conveniently deposited at room temperature onto plastic substrates.