Showing papers in "Thin Solid Films in 1991"

TL;DR: In this article, the tendency towards a specific preferred orientation is discussed on the basis of strain and surface energies, and a decrease in lattice parameter with increasing temperature was observed on annealing.

TL;DR: In this article, the porosity and refractive index of thin films from polymeric precursors are varied as follows: volume percent porosity (0% -56%), pore radius (0-3.1 nm); surface area (1.2-263 m 2 g -1 ); refractive indices (118-1.45).

TL;DR: In this article, a simple expression to evaluate the residual stress in a plasma-sprayed coating is given for the case where the coating thickness is much smaller than the substrate thickness.

TL;DR: Hard Ti x N and (Ti 1− x Al x )N films were prepared using the cathodic arc ion plating method as discussed by the authors, and they exhibited a cubic structure.

TL;DR: In this paper, a spray pyrolysing solution of zinc acetate and aluminium chloride was used to produce transparent conducting thin films of aluminium-doped zinc oxide, which have a resistivity of 10 −3 ω cm and a visible transmission of 85%.

TL;DR: In this article, a spherical C60 cluster (Buckminsterfullerene) compressed between graphite planes is studied and it is shown that the cluster can reversibly deform under anisotropic compression to a radius (in the direction of compression) that is 13 that of the uncompressed cluster.

TL;DR: In this paper, the structural and electrical properties of polycrystalline sprayed SnO2 films formed at 500 °C have been investigated in a wide carrier concentration range (7 × 1017 cm−3).

TL;DR: In this article, a strong correlation is found between optical quantities and microscopic properties of TiO2 films, which is connected to variations in density, stoichiometry, hydrogen content (H2O), and binding structure of the layers.

TL;DR: In this article, the structure of a plasma-sprayed Al2O3 coating was studied by observing copper deposited in the coating by electroplating and the distribution of copper in the microstructures of the electroplated coating revealed clearly the existence of micropores, a non-bonded area between ceramic lamellae, and micro-cracks in individual flattened particles.

TL;DR: In this paper, electrical conductivity, Hall mobility, thermoelectric power and optical properties were studied for indium-doped zinc oxide films produced by the magnetron sputtering technique.

TL;DR: In this article, the structural properties of planar magnetron sputtered ZnO films are studied as a function of deposition parameters: substrate type, substrate temperature, sputter gas pressure, growth rate and sputtering power.

TL;DR: In this paper, the growth of thin film vanadium oxides on a vanadium substrate under oxygen partial pressure has been investigated over a range of temperatures and times, and a variety of oxide structures in the range VO2V2O5 have been grown.

TL;DR: In this article, a transparent conductive indium tin oxide thin films were prepared by an atmospheric pressure chemical vapour deposition method without using an oxygen donor, and the effects of tin doping on the structure and characteristics of the film were discussed by comparing the results with the corresponding values for non-doped indium oxide film.

TL;DR: In this article, the authors used surface acoustic wave (SAW) devices to follow the process of vacuum deposition of thin metal films (5-500 A), the (room temperature) relaxation of such films after their deposition, and the chemisorption-induced changes in both the mass density and electrical conductivity of these films.

TL;DR: In this paper, a variety of analytical tools have been applied to examine the composition and morphology of thin films of hafnium dioxide deposited under a wide variety of conditions. But the results from these measurements are correlated with the observed optical properties.

TL;DR: In this article, the electrical properties of tin selenide films deposited by flash evaporation onto glass, mica and KCl substrates were reported, and the films were found to be p type.

TL;DR: In this article, sputter deposition was used to grow epitaxial tin oxide (SnO2) films on TiO2 and sapphire substrates, which appeared to be stoichiometric.

TL;DR: In this paper, a sol-gel derived, transparent, electrically conducting tin-doped In2O3 film system has been developed which only requires air baking and can approximate the properties of sputtered and hot-sprayed films but are simpler and less expensive to apply by dipping and spinning procedures.

TL;DR: In this article, a single-source organometallic chemical vapour deposition was successfully introduced using Bu n In(SPr i ) 2 as a precursor molecule and tetragonal β-In 2 S 3 thin layers with a strongly preferred (103) growth orientation were obtained on Si(111) and quartz substrates at a substrate temperature T sub of 300-400°C.

TL;DR: In this article, a-C:H layers prepared at different ion energies have been investigated by several methods including 13C nuclear magnetic resonance (NMR), electron energy loss spectroscopy (EELS) and electron spin resonance (ESR).

TL;DR: The effect of annealing on the optical properties of indium tin oxide films prepared by d.c. magnetron sputtering was investigated in this paper, which can be described in terms of a change in free electron concentration.

TL;DR: In this paper, plan-view and cross-sectional transmission electron microscopy of polycrystalline NaCl-structure Ti 1− x Al x N (x ≤ 0.5) and TiN films deposited by reactive magnetron sputter deposition is shown.

TL;DR: In this paper, the effects of post-deposition heat treatment in vacuum and hydrogen atmosphere on the above properties were studied to derive meaningful information on the scattering mechanisms in ZnO:Al films.

TL;DR: In this paper, the diffusion of zinc atoms was conducted through grain boundaries and caused an increase in carrier concentration and Hall mobility and hence a decrease in resistivity, and diffused zinc atoms were very effective in suppressing an increase of resistivity in air.

TL;DR: In this paper, compositional and alloyed films of TiN containing aluminum, zirconium, chromium and niobium were investigated by X-ray diffraction, electron microscopy and microhardness measurements.

TL;DR: In this paper, resistors with near zero temperature coefficient of resistance (TCR) were realized by optimizing the sputtering conditions, which demonstrated that the TCR was a strong function of substrate temperature during sputtering.

TL;DR: In this article, the preparation and characterization of thin films of silicon nitride deposited by the technique of plasma-enhanced chemical vapor deposition is reviewed and the applications of silicon-nitride thin films in integrated circuit technology are also reviewed.

TL;DR: In this article, the evolution through two polycrystalline states was analysed by X-ray diffraction techniques, which revealed that the LiF film lattice parameter is equal to that of LiF crystal.

TL;DR: In this article, the electrical properties of planar magnetron sputtered ZnO films are studied by means of currentvoltage, capacitance-voltage and Van der Pauw measurements.

TL;DR: In this article, the effects on diamond deposition of substrate preparation and position in the oxygen-acetylene flame have been examined, and diagrams relating diamond, microcrystalline graphite and amorphous carbon growth to the oxygen:acetylene flow ratio and substrate temperature were developed.