E
Erick Ulin-Avila
Researcher at University of California, Berkeley
Publications - 19
Citations - 6139
Erick Ulin-Avila is an academic researcher from University of California, Berkeley. The author has contributed to research in topics: Metamaterial & Surface plasmon. The author has an hindex of 11, co-authored 19 publications receiving 5543 citations.
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Journal ArticleDOI
A graphene-based broadband optical modulator
Ming Liu,Xiaobo Yin,Erick Ulin-Avila,Baisong Geng,Thomas Zentgraf,Long Ju,Feng Wang,Feng Wang,Xiang Zhang,Xiang Zhang +9 more
TL;DR: Graphene-based optical modulation mechanism, with combined advantages of compact footprint, low operation voltage and ultrafast modulation speed across a broad range of wavelengths, can enable novel architectures for on-chip optical communications.
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Three-dimensional optical metamaterial with a negative refractive index
Jason Valentine,Shuang Zhang,Thomas Zentgraf,Erick Ulin-Avila,Dentcho A. Genov,Guy Bartal,Xiang Zhang,Xiang Zhang +7 more
TL;DR: Bulk optical metamaterials open up prospects for studies of 3D optical effects and applications associated with NIMs and zero-index materials such as reversed Doppler effect, superlenses, optical tunnelling devices, compact resonators and highly directional sources.
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High- Q surface-plasmon-polariton whispering-gallery microcavity
Bumki Min,Bumki Min,Bumki Min,Eric Ostby,Volker J. Sorger,Erick Ulin-Avila,Lan Yang,Lan Yang,Xiang Zhang,Xiang Zhang,Kerry J. Vahala +10 more
TL;DR: A high-Q SPP whispering-gallery microcavity that is made by coating the surface of a high- Q silica microresonator with a thin layer of a noble metal is demonstrated and Q factors of 1,376 ± 65 can be achieved in the near infrared for surface-plasmonic whispering- gallery modes at room temperature.
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Observation of Stimulated Emission of Surface Plasmon Polaritons
TL;DR: The design, fabrication, and characterization of SPP waveguides, thin gold metal strips, embedded in erbium (Er) doped phosphate glass is presented, which can be suitable as integrated devices coupling electronic and photonic data transmissions as well as SPP amplifiers and SPP lasers.
Journal ArticleDOI
Maskless plasmonic lithography at 22 nm resolution.
Liang Pan,Yong-Shik Park,Yi Xiong,Erick Ulin-Avila,Yuan Wang,Li Zeng,Shaomin Xiong,Junsuk Rho,Cheng Sun,David B. Bogy,Xiang Zhang +10 more
TL;DR: A novel multi-stage scheme that is capable of efficiently compressing the optical energy at deep sub-wavelength scales through the progressive coupling of propagating surface plasmons (PSPs) and localized surface plasons (LSPs) and it opens a new approach towards the next generation semiconductor manufacturing.