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Erick Ulin-Avila

Researcher at University of California, Berkeley

Publications -  19
Citations -  6139

Erick Ulin-Avila is an academic researcher from University of California, Berkeley. The author has contributed to research in topics: Metamaterial & Surface plasmon. The author has an hindex of 11, co-authored 19 publications receiving 5543 citations.

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A graphene-based broadband optical modulator

TL;DR: Graphene-based optical modulation mechanism, with combined advantages of compact footprint, low operation voltage and ultrafast modulation speed across a broad range of wavelengths, can enable novel architectures for on-chip optical communications.
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Three-dimensional optical metamaterial with a negative refractive index

TL;DR: Bulk optical metamaterials open up prospects for studies of 3D optical effects and applications associated with NIMs and zero-index materials such as reversed Doppler effect, superlenses, optical tunnelling devices, compact resonators and highly directional sources.
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High- Q surface-plasmon-polariton whispering-gallery microcavity

TL;DR: A high-Q SPP whispering-gallery microcavity that is made by coating the surface of a high- Q silica microresonator with a thin layer of a noble metal is demonstrated and Q factors of 1,376 ± 65 can be achieved in the near infrared for surface-plasmonic whispering- gallery modes at room temperature.
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Observation of Stimulated Emission of Surface Plasmon Polaritons

TL;DR: The design, fabrication, and characterization of SPP waveguides, thin gold metal strips, embedded in erbium (Er) doped phosphate glass is presented, which can be suitable as integrated devices coupling electronic and photonic data transmissions as well as SPP amplifiers and SPP lasers.
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Maskless plasmonic lithography at 22 nm resolution.

TL;DR: A novel multi-stage scheme that is capable of efficiently compressing the optical energy at deep sub-wavelength scales through the progressive coupling of propagating surface plasmons (PSPs) and localized surface plasons (LSPs) and it opens a new approach towards the next generation semiconductor manufacturing.