Showing papers by "Errol Antonio C. Sanchez published in 2009"

PDF

Open Access

Patent•

Apparatus to control semiconductor film deposition characteristics

[...]

Satheesh Kuppurao¹, David K. Carlson¹, Manish Hemkar¹, Andrew Lam¹, Errol Antonio C. Sanchez¹, Howard Beckford¹ - Show less +2 more•Institutions (1)

Applied Materials¹

27 Feb 2009

TL;DR: In this article, the authors described a system and apparatus for adjusting the temperature of at least a portion of the surface of a reaction chamber during a film formation process to control film properties.

...read moreread less

Abstract: Systems and apparatus are disclosed for adjusting the temperature of at least a portion of the surface of a reaction chamber during a film formation process to control film properties. More than one portion of the chamber surface may be temperature-modulated.

...read moreread less

4 citations