Frank Sundermann

TL;DR: In this study, a new approach to the calibration of a resist model will be proposed based upon the location of calibration structures within the actual resist space over which the resist model is expected to be predictive.

TL;DR: In this article, a technique known as Critical Failure ORC (CFORC) was introduced that uses optical parameters from aerial image simulations to correlate these optical parameters with experimental data taken throughout the process window to predict printing errors.

TL;DR: In this article, the authors present a new technique (Critical Failure ORC or CF-ORC) to check the robustness of the structures created by OPC through the process window.

TL;DR: This paper analyzes the possible need and applications for model-based physical design restrictions (MBPDR), and discusses examples of specific design rule challenges requiring new solution methods in the patterning regime of low K1 lithography and highly complex RET.

TL;DR: The automated DoseRecipe creation is now running since the beginning of 2011 contributing to bring both intrafield and intrawafer GATE CDu below 1nm 3sigma, for 45/40 & 28nm nodes.