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Fred Bijkerk

Researcher at Carl Zeiss AG

Publications -  16
Citations -  155

Fred Bijkerk is an academic researcher from Carl Zeiss AG. The author has contributed to research in topics: Extreme ultraviolet lithography & Layer (electronics). The author has an hindex of 6, co-authored 16 publications receiving 152 citations. Previous affiliations of Fred Bijkerk include Fundamental Research on Matter Institute for Atomic and Molecular Physics.

Papers
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Journal ArticleDOI

Pulsed-laser irradiated silicon studied by time-resolved x-ray absorption (90-300 eV).

TL;DR: Analyse du spectre L de couches minces de silicium amorphe irradiees par impulsions laser de 0,1 a 3,6 J/cm 2 ; mise en evidence de differences importantes par rapport au spectre de a−Si non irradie.
Proceedings ArticleDOI

New PTB beamlines for high-accuracy EUV reflectometry at BESSY II

TL;DR: In this paper, the beamline characteristics of the beamlines are presented and the results of beamline characterization on photon flux, spectral resolution, spectral purity and beam stability with special respect to the EUV photon energy range.
Patent

Reflective optical element for EUV lithography device

TL;DR: In this article, a reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range, and two additional intermediate layers are provided between the absorber layer and the spacer layer, where the first layer increases the reflectivity and the second layer prevents chemical interaction between them.
Proceedings ArticleDOI

Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability

TL;DR: In this paper, the authors demonstrate the ability to obtain a uniformity of the d-spacing of the coating of better than +/- 0.05% over a 6' area, both on flat and concave surfaces (uniformity specified in terms of wavelength of maximum reflectance).
Proceedings ArticleDOI

Multilayer x-ray mirrors for the objective crystal spectrometer on the Spectrum Roentgen Gamma satellite

TL;DR: In this article, the effect of different polishing parameters on the smoothening of the Co- and Ni-layers was examined and the results showed that the Co/C and Ni/C coatings on the flight crystals have a period Lambda of 3.16 nm during deposition and the ex-situ grazing incidence reflectivity of Cu-K(alpha ) radiation (lambda equals 0.154 nm) were used to analyze the coatings.