F
Fred Bijkerk
Researcher at Carl Zeiss AG
Publications - 16
Citations - 155
Fred Bijkerk is an academic researcher from Carl Zeiss AG. The author has contributed to research in topics: Extreme ultraviolet lithography & Layer (electronics). The author has an hindex of 6, co-authored 16 publications receiving 152 citations. Previous affiliations of Fred Bijkerk include Fundamental Research on Matter Institute for Atomic and Molecular Physics.
Papers
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Journal ArticleDOI
Pulsed-laser irradiated silicon studied by time-resolved x-ray absorption (90-300 eV).
Kouichi Murakami,Hans C. Gerritsen,Hedser Van Brug,Fred Bijkerk,F.W. Saris,Marnix J. van der Wiel +5 more
TL;DR: Analyse du spectre L de couches minces de silicium amorphe irradiees par impulsions laser de 0,1 a 3,6 J/cm 2 ; mise en evidence de differences importantes par rapport au spectre de a−Si non irradie.
Proceedings ArticleDOI
New PTB beamlines for high-accuracy EUV reflectometry at BESSY II
Frank Scholze,Burkhard Beckhoff,G. Brandt,R. Fliegauf,Roman Klein,Bernd Meyer,D. Rost,Detlef Schmitz,M. Veldkamp,Jan Weser,Gerhard Ulm,Eric Louis,Andrey E. Yakshin,Sebastian Oestreich,Fred Bijkerk +14 more
TL;DR: In this paper, the beamline characteristics of the beamlines are presented and the results of beamline characterization on photon flux, spectral resolution, spectral purity and beam stability with special respect to the EUV photon energy range.
Patent
Reflective optical element for EUV lithography device
Andrey Yakshin,Robbert Wilhelmus Elisabeth van de Kruijs,Fred Bijkerk,Eric Louis,Ileana Nedelcu +4 more
TL;DR: In this article, a reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range, and two additional intermediate layers are provided between the absorber layer and the spacer layer, where the first layer increases the reflectivity and the second layer prevents chemical interaction between them.
Proceedings ArticleDOI
Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability
Eric Louis,Andrey E. Yakshin,Peter Cornelis Goerts,Sebastian Oestreich,Edward L. G. Maas,M. J. H. Kessels,Detlef Schmitz,Frank Scholze,Gerhard Ulm,S. Muellender,Markus Haidl,Fred Bijkerk +11 more
TL;DR: In this paper, the authors demonstrate the ability to obtain a uniformity of the d-spacing of the coating of better than +/- 0.05% over a 6' area, both on flat and concave surfaces (uniformity specified in terms of wavelength of maximum reflectance).
Proceedings ArticleDOI
Multilayer x-ray mirrors for the objective crystal spectrometer on the Spectrum Roentgen Gamma satellite
Eric Louis,Eberhard Adolf Spiller,Salim Abdali,Finn Erland Christensen,H.-J. Voorma,Norbert B. Koster,Peter K. Frederiksen,Charles S. Tarrio,Eric M. Gullikson,Fred Bijkerk +9 more
TL;DR: In this article, the effect of different polishing parameters on the smoothening of the Co- and Ni-layers was examined and the results showed that the Co/C and Ni/C coatings on the flight crystals have a period Lambda of 3.16 nm during deposition and the ex-situ grazing incidence reflectivity of Cu-K(alpha ) radiation (lambda equals 0.154 nm) were used to analyze the coatings.