scispace - formally typeset
H

H. Ohnishi

Researcher at Fujitsu

Publications -  27
Citations -  532

H. Ohnishi is an academic researcher from Fujitsu. The author has contributed to research in topics: Quantum tunnelling & Transistor. The author has an hindex of 11, co-authored 27 publications receiving 528 citations.

Papers
More filters
Journal ArticleDOI

Self‐consistent analysis of resonant tunneling current

TL;DR: In this article, the authors investigated the currentvoltage characteristics of the double barrier, resonant tunneling structure, using a self-consistent method, and noted the significance of the effects of band bending and buildup of space charge in the quantum well.
Journal ArticleDOI

Effect of Silicon Doping Profile on I-V Characteristics of an AlGaAs/GaAs Resonant Tunneling Barrier Structure Grown by MBE

TL;DR: In this article, the effect of Si doping profile on I-V characteristics of an AlGaAs/GaAs resonant tunneling barrier (RTB) structure was studied by changing the thickness of an undoped GaAs "spacer" layer placed adjacent to the RTB.
Journal ArticleDOI

Excellent Negative Differential Resistance of InAlAs/InGaAs Resonant Tunneling Barrier Structures Grown by MBE

TL;DR: In this paper, light electron effective mass was found to be a very important parameter for improving the negative differential resistance (NDR) of a resonant tunneling barrier (RTB) structure.
Journal ArticleDOI

Resonant-tunneling hot electron transistor (RHET)

TL;DR: The InGaAs-based hot electron transistors (RHET) as discussed by the authors achieved a peak-to-valley ratio of 19.3, with a maximum of 21.7.
Journal ArticleDOI

Resonant tunneling hot‐electron transistor with current gain of 5

TL;DR: In this article, an asymmetric resonant tunneling barrier with an optimal well thickness was proposed to attain a higher peak-to-valley ratio for the collector current, achieving a common emitter current gain of 5.1 (at 77 K).