A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

An exemplary printable composition of a liquid or gel suspension of diodes comprises a plurality of diodes, a first solvent and/or a viscosity modifier. An exemplary apparatus comprises: a plurality of diodes; at least a trace amount of a first solvent; and a polymeric or resin film at least partially surrounding each diode of the plurality of diodes. Various exemplary diodes have a lateral dimension between about 10 to 50 microns and about 5 to 25 microns in height. Other embodiments may also include a plurality of substantially chemically inert particles having a range of sizes between about 10 to about 50 microns.

Apparatus with light emitting or absorbing diodes

The present invention provides an electronic apparatus, such as a lighting device comprised of light emitting diodes (LEDs) or a power generating apparatus comprising photovoltaic diodes, which may be created through a printing process, using a semiconductor or other substrate particle ink or suspension and using a lens particle ink or suspension. An exemplary apparatus comprises a base; at least one first conductor; a plurality of diodes coupled to the at least one first conductor; at least one second conductor coupled to the plurality of diodes; and a plurality of lenses suspended in a polymer deposited or attached over the diodes. The lenses and the suspending polymer have different indices of refraction. In some embodiments, the lenses and diodes are substantially spherical, and have a ratio of mean diameters or lengths between about 10:1 and 2:1. The diodes may be LEDs or photovoltaic diodes, and in some embodiments, have a junction formed at least partially as a hemispherical shell or cap.

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Light emitting, photovoltaic or other electronic apparatus and system

An exemplary printable composition of a liquid or gel suspension of diodes comprises a plurality of diodes, a first solvent and/or a viscosity modifier. An exemplary diode comprises: a light emitting or absorbing region having a diameter between about 20 and 30 microns and a height between 2.5 to 7 microns; a plurality of first terminals spaced apart and coupled to the light emitting region peripherally on a first side, each first terminal of the plurality of first terminals having a height between about 0.5 to 2 microns; and one second terminal coupled centrally to a mesa region of the light emitting region on the first side, the second terminal having a height between 1 to 8 microns.

Diode for a printable composition

A light emitting diode (LED) light engine is provided for use in a light fixture to enable improved and efficient dissipation of heat generated in the light fixture. The light engine includes a circuit board that includes multiple LEDs for emitting light. The light engine includes a chassis that has a plurality of upper fins that extend upward from a central flanged portion to dissipate heat generated by the LEDs into the lighting fixture. The circuit board is mounted to a mounting surface on the chassis that is surrounded by a fin wall that depends from the central flanged portion. The chassis also has a plurality of lower fins that extend outward from an outer surface of the fin wall to dissipate heat out of the fixture and into the ambient air environment.

LED light engine apparatus

A light source module has a reflector having a light reflection face and a plurality of light emitting elements. The light reflection face is curved in a circular arc shape in a width direction of the reflector and extends in a longitudinal direction of the reflector. The light emitting elements are arranged in a center portion in the width direction of the light reflection face and are arranged linearly along the longitudinal direction of the reflector.

Light source module having a plurality of light-emitting elements and illumination apparatus

Toshiba and Toshiba Machine have developed an advanced electron beam writing system EX-11 for next-generation mask fabrication. EX-11 is a 50 kV variable-shaped beam lithography system for manufacturing 4x masks for 0.15 - 0.18 micrometer technology generation. Many breakthroughs were studied and applied to EX-11 to meet future mask-fabrication requirements, such as critical dimension and positioning accuracy. We have verified the accuracy required for 0.15 - 0.18 micrometer generation.

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

A light source module (12) has a reflector (14) having a light reflection face (14a) and a plurality of light emitting elements (11). The light reflection face (14a) is curved in a circular arc shape in a width direction of the reflector (14) and extends in a longitudinal direction of the reflector (14). The light emitting elements (11) are arranged in a center portion in the width direction of the light reflection face (14a) and are arranged linearly along the longitudinal direction of the reflector (14).

Light source module for outdoor lighting compriisng a plurality of LEDs

PROBLEM TO BE SOLVED: To provide a charged beam writing apparatus and a method, capable of correcting astigmatism, without being limited in the direction for which the astigmatism correction value is max. in a deflection region, as seen from the polarization center. SOLUTION: Gain correction value ±K1 sin θ1, ±K1 cos θ1, ±K2 sin θ2, ±K2 cos θ2 of a deflection control means 10 are obtained to correct the astigmatism according to the polarizing position, using correction sensitivities b1, b2, c1, c2 which show the relation between astigmatic correction values of an astigmatic correcting coil 12 and astigmatism correction voltage of an electrostatic deflector 4, coefficients a11, a12, a21, a22 indicating the relation between the astigmatic correction values of the astigmatic correction coil 12 and deflecting positions, and angle θ1, θ2 showing the directions; in which the astigmatic correction values are max. in a deflecting region, as seen from the deflecting center. COPYRIGHT: (C)2000,JPO

Charged beam writing apparatus and method of correcting astigmatism of charged beam

The scaling of semiconductor devices is slowing down because of the difficulty in establishing their functionality at the nano-size level and also because of the limitations in fabrications, mainly the delay of EUV lithography. While multigate devices (FinFET) are currently the main driver for scalability, other types of devices, such as 3D devices, are being realized to relax the scaling of the node. In lithography, double or multiple patterning using ArF immersion scanners is still a realistic solution offered for the hp16nm node fabrication. Other lithography candidates are those called NGL (Next Generation Lithography), such as DSA (Directed-Self-Assembling) or nanoimprint. In such situations, shot count for mask making by electron beam writers will not increase. Except for some layers, it is not increasing as previously predicted. On the other hand, there is another aspect that increases writing time. The exposure dose for mask writing is getting higher to meet tighter specifications of CD uniformity, in other words, reduce LER. To satisfy these requirements, a new electron beam mask writer, EBM-9000, has been developed for hp16nm/logic11nm generation. Electron optical system, which has the immersion lens system, was evolved from EBM-8000 to achieve higher current density of 800A/cm2. In this paper, recent shot count and dose trend are discussed. Also, writing time is estimated for the requirements in EBM-9000.

Hirokazu Yamada

Papers

Light source module having a plurality of light-emitting elements and illumination apparatus

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Light source module for outdoor lighting compriisng a plurality of LEDs

Charged beam writing apparatus and method of correcting astigmatism of charged beam

Writing time estimation of EB mask writer EBM-9000 for hp16nm/logic11nm node generation