H
Hisato Ogiso
Researcher at National Institute of Advanced Industrial Science and Technology
Publications - 92
Citations - 1224
Hisato Ogiso is an academic researcher from National Institute of Advanced Industrial Science and Technology. The author has contributed to research in topics: Ion implantation & Ion. The author has an hindex of 14, co-authored 90 publications receiving 1142 citations.
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Ultrasonic force microscopy for nanometer resolution subsurface imaging
TL;DR: In this paper, a sample of atomic force microscope (AFM) is vertically vibrated at ultrasonic frequencies much higher than the cantilever resonance, the tip cannot vibrate but it is cyclically indented into the sample.
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Electrical Conduction of Conjugated Molecular SAMs Studied by Conductive Atomic Force Microscopy
TL;DR: In this article, the electrical conduction of self-assembled monolayers (SAMs) made from conjugated molecules was measured using conductive atomic force microscopy (AFM), with a focus on the molecular structural properties.
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Indentation method to measure the residual stress induced by ion implantation
TL;DR: In this paper, a depth-sensing indentation system was used to measure the residual stress in a stainless steel plate implanted by Fe2+ ions with an energy of 3MeV at a dose of 3.×.1016 cm−2.
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Analysis of Subsurface Imaging and Effect of Contact Elasticity in the Ultrasonic Force Microscope
TL;DR: In this article, the authors examined the characteristics of subsurface imaging with nanometer resolution and the effect of contact elasticity in the ultrasonic force microscope (UFM) and the shift of the averaged tip-sample distance.
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DLC Coating by HiPIMS: The Influence of Substrate Bias Voltage
TL;DR: In this article, it was found that the position and the full width at half maximum of the graphite peak show a minimum and a maximum at a bias voltage of ${-}{\rm 100}~{\rm V}$.