H
Hyung Ho Park
Researcher at Yonsei University
Publications - 598
Citations - 9459
Hyung Ho Park is an academic researcher from Yonsei University. The author has contributed to research in topics: Thin film & Aerogel. The author has an hindex of 40, co-authored 562 publications receiving 7606 citations. Previous affiliations of Hyung Ho Park include KAIST & Sungkyunkwan University.
Papers
More filters
Journal ArticleDOI
Silica aerogel: synthesis and applications
TL;DR: In this paper, a review of the synthesis of silica aerogels by the sol-gel method, as well as drying techniques and applications in current industrial development and scientific research is presented.
Journal ArticleDOI
In vivo antioxidant effect of green tea.
TL;DR: Total antioxidant capacity of plasma was significantly increased after taking green tea in amounts of 300 and 450 ml, and a positive increment according to green tea dosage was also observed.
Journal ArticleDOI
Preparation and Characterization of Zinc Oxide Nanoparticles Using Leaf Extract of Sambucus ebulus
S. Alamdari,Morteza Sasani Ghamsari,Chan Lee,Wooje Han,Hyung Ho Park,M J Tafreshi,Hosein Afarideh,M.H. Majles Ara +7 more
TL;DR: In this article, zinc oxide nanoparticles (ZnO NPs) were prepared using S. ebulus leaf extract, and their physicochemical properties were investigated using X-ray diffraction (XRD) results revealed that the prepared NPs are highly crystalline, having a wurtzite crystal structure.
Journal ArticleDOI
Crystal structure, properties and nanostructuring of a new layered chalcogenide semiconductor, Bi2MnTe4
Dong Sun Lee,Tae-Hoon Kim,Cheol-Hee Park,Chan Yeup Chung,Young Soo Lim,Won Seon Seo,Hyung Ho Park +6 more
TL;DR: In this article, a new layered chalcogenide semiconductor, Bi2MnTe4, was discovered and its crystal structure was determined by powder X-ray diffraction and Rietveld refinement.
Journal ArticleDOI
Compositional and structural analysis of aluminum oxide films prepared by plasma-enhanced chemical vapor deposition
TL;DR: In this paper, the chemical composition, states of functional groups and microstructure of the aluminum oxide films were investigated using FTIR, XPS, AES and TEM, and it was found that carbon and hydrogen atoms are incorporated less at higher deposition temperatures and are almost completely removed as CO2 and H2O, by post-deposition heat treatment at 800 °C in an oxygen environment.