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Isao Amemiya
Researcher at Hoya Corporation
Publications - 29
Citations - 271
Isao Amemiya is an academic researcher from Hoya Corporation. The author has contributed to research in topics: Electron-beam lithography & Lithography. The author has an hindex of 10, co-authored 29 publications receiving 271 citations.
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Patent
Display device and method of driving the same
Yukio Kizaki,Rei Hasegawa,Hajime Yamaguchi,Hitoshi Nagato,Yukitami Mizuno,Isao Amemiya,Tomio Ono +6 more
TL;DR: In this paper, the voltage source is configured to generate a driving voltage between the first and second electrodes so as to apply first-and second-absolute potentials, which are maintained at one and opposite polarities in respect to the reference potential during a predetermined segment period respectively.
Patent
Light emitting device and method of manufacturing the same
TL;DR: In this article, a method of manufacturing a light-emitting device is described, which includes mounting a light emitting chip on a substrate, forming a transparent resin portion and a phosphor layer by using a liquid droplet discharging apparatus.
Patent
Production of projection mask
TL;DR: In this paper, the substrate is subjected only to wet etching on the reverse thereof to form grooves and is separated into the plurality of the projection masks by the use of the grooves formed on the surface of the substrate.
Journal ArticleDOI
High-performance membrane mask for electron projection lithography
TL;DR: In this paper, a high-performance membrane mask for electron projection lithography (EPL) systems is proposed, which consists of a 600-nm-thick diamond-like carbon (DLC) scatter on a DLC membrane 30-60 nm thick.
Patent
Mold for imprinting and production method thereof
TL;DR: In this article, a mold for imprinting which comprises a substrate provided thereon a flattening layer having a layer made of flattening agent, wherein the flatting layer is provided by a fine pattern forming layer.