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Isao Amemiya

Researcher at Hoya Corporation

Publications -  29
Citations -  271

Isao Amemiya is an academic researcher from Hoya Corporation. The author has contributed to research in topics: Electron-beam lithography & Lithography. The author has an hindex of 10, co-authored 29 publications receiving 271 citations.

Papers
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Patent

Display device and method of driving the same

TL;DR: In this paper, the voltage source is configured to generate a driving voltage between the first and second electrodes so as to apply first-and second-absolute potentials, which are maintained at one and opposite polarities in respect to the reference potential during a predetermined segment period respectively.
Patent

Light emitting device and method of manufacturing the same

TL;DR: In this article, a method of manufacturing a light-emitting device is described, which includes mounting a light emitting chip on a substrate, forming a transparent resin portion and a phosphor layer by using a liquid droplet discharging apparatus.
Patent

Production of projection mask

TL;DR: In this paper, the substrate is subjected only to wet etching on the reverse thereof to form grooves and is separated into the plurality of the projection masks by the use of the grooves formed on the surface of the substrate.
Journal ArticleDOI

High-performance membrane mask for electron projection lithography

TL;DR: In this paper, a high-performance membrane mask for electron projection lithography (EPL) systems is proposed, which consists of a 600-nm-thick diamond-like carbon (DLC) scatter on a DLC membrane 30-60 nm thick.
Patent

Mold for imprinting and production method thereof

TL;DR: In this article, a mold for imprinting which comprises a substrate provided thereon a flattening layer having a layer made of flattening agent, wherein the flatting layer is provided by a fine pattern forming layer.