I
Ishibashi Takeo
Researcher at Asahi Glass Co.
Publications - 21
Citations - 205
Ishibashi Takeo is an academic researcher from Asahi Glass Co.. The author has contributed to research in topics: Resist & Layer (electronics). The author has an hindex of 7, co-authored 21 publications receiving 205 citations. Previous affiliations of Ishibashi Takeo include Renesas Electronics & Mitsubishi.
Papers
More filters
Patent
Material for forming a fine pattern and method for manufacturing a semiconductor device using the same
TL;DR: In this paper, a resist pattern, containing a material capable of generating an acid by exposure to light, is covered with a resist consisting of a crosslinkage in the presence of an acid, and a crosslinked layer is formed at the interface as a cover layer for the resist pattern.
Patent
Method of manufacturing a semiconductor device using a minute resist pattern, and a semiconductor device manufactured thereby
TL;DR: In this article, a method of producing a pure resist pattern having superior topography smaller than the limit of wavelength of exposure light is described, where a first resist pattern containing material capable of producing an acid on exposure to light is coated with a second resist containing material which causes a crosslinking reaction in the presence of an acid.
Patent
Micropattern forming material, micropattern forming method and method for manufacturing semiconductor device
TL;DR: A micropattern forming material comprises a polar change material formed on a resist pattern capable of generating an acid, the polar change materials being soluble in water or an alkali, a portion of the polar changes material in contact with the resist pattern undergoing a polar changes caused by the acid from the resist patterns to form an insolubilized film insoluble in water and the alkali; and water or mixed solvent of water and a water-soluble organic solvent as mentioned in this paper.
Patent
Production of semiconductor device and semiconductor device
TL;DR: In this article, a polyacrylic acid is applied to form an org. film on a semiconductor substrate on which a resist pattern is formed, heat-treating the org.film to render the surface layer to be insoluble with an alkali developer.
Patent
Water-repellant composition for substrate to be exposed, method of forming resist pattern, electronic device produced by the formation method, method of imparting water repellency to substrate to be exposed, water-repellant set for substrate to be ex
TL;DR: A water-repellant composition for substrates to be exposed is provided in this paper, which inhibits the back side of the substrates being exposed from being contaminated by an immersion liquid, can improve adhesion between the film to be processed and an organic film directly overlying that film to inhibit film peeling, and has excellent workability.