J
Jan-Peter Urbach
Researcher at SEMATECH
Publications - 7
Citations - 102
Jan-Peter Urbach is an academic researcher from SEMATECH. The author has contributed to research in topics: Aerial image & Photomask. The author has an hindex of 5, co-authored 7 publications receiving 101 citations.
Papers
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Proceedings ArticleDOI
Aerial Image Microscope for the inspection of defects in EUV masks
Anton Barty,John S. Taylor,Russell M. Hudyma,Eberhard Spiller,Donald W. Sweeney,Gilbert V. Shelden,Jan-Peter Urbach +6 more
TL;DR: In this paper, an EUV Aerial Image Microscope (AIM) similar to the current AIM tools for 248nm and 193nm exposure wavelength is proposed for patterned EUV mask inspection.
Proceedings ArticleDOI
EUV substrate and blank inspection with confocal microscopy
TL;DR: In this paper, the authors report results from a EUVL blank inspection tool developed by Lasertec at 488nm inspection wavelength on quartz substrates, and compare these results to previously reported data on the wafer version (M350) of the current M1350.
Proceedings ArticleDOI
First results from AIMS beta tool for 157-nm lithography
Silvio Teuber,Iwao Higashikawa,Jan-Peter Urbach,Christof Matthias Dr. Schilz,Roderick Koehle,Axel Zibold +5 more
TL;DR: In this paper, the first results obtained with these beta tools, including measurements on binary as well as alternating phase shift masks, were discussed with regards to the capability of the tool for defect qualification on photomasks.
Proceedings ArticleDOI
Aerial image measurement system for 157-nm lithography
Klaus Dr. Eisner,Peter Kuschnerus,Jan-Peter Urbach,Christof Matthias Dr. Schilz,Thomas Engel,Axel Zibold,Takashi Yasui,Iwao Higashikawa +7 more
TL;DR: The worldwide first Aerial Image Measurement System (AIMS) for 157 nm lithography has been used to measure binary chrome and attenuated phase shift masks at 157 nm wavelength as discussed by the authors.
Proceedings ArticleDOI
Actinic aerial image measurement tool for 157-nm mask qualification
Takashi Yasui,Iwao Higashikawa,Peter Kuschnerus,Thomas Engel,Axel Zibold,Claudia Hertfelder,Yuji Kobiyama,Jan-Peter Urbach,Christof Matthias Dr. Schilz,Armin Semmler +9 more
TL;DR: In this paper, the results from measurements on the alpha tool of some 157 nm attenuated phase shift masks (Att-PSM) are discussed and resolution results and CD evaluation with respect to these measurements are presented.