J
Jane Margaret Shaw
Researcher at IBM
Publications - 9
Citations - 847
Jane Margaret Shaw is an academic researcher from IBM. The author has contributed to research in topics: Electron mobility & Pentacene. The author has an hindex of 3, co-authored 9 publications receiving 843 citations.
Papers
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Journal ArticleDOI
Low-Voltage Organic Transistors on Plastic Comprising High-Dielectric Constant Gate Insulators
Christos D. Dimitrakopoulos,Sampath Purushothaman,J. Kymissis,Alessandro C. Callegari,Jane Margaret Shaw +4 more
TL;DR: An all-room-temperature fabrication process sequence was used, which enabled the demonstration of high-performance organic IGFETs on transparent plastic substrates, at low operating voltages for organic devices.
Patent
A process for rendering a polymeric material resistant to an oxygen-containing plasma
Babich Edward Darko,Michael Hatzakis,Scott Laurence Jacobs,Juri Rostyslav Parasczcak,Jane Margaret Shaw,David F. Witman +5 more
TL;DR: In this paper, a polymeric material containing reactive hydrogen functional groups is rendered resistant to an oxygen-containing plasma by reacting the polymeric materials with a multifunctional organometallic material such as hexamethylcyclotrisilazane.
Patent
Composition capable of being imaged and use of such a composition
Edward D. Babich,Donis George Flagello,Michael Hatzakis,Jurij R. Paraszczak,Jane Margaret Shaw,David F. Witman +5 more
TL;DR: In this paper, an organosilicon compound having as the terminal groups, quinone diazo groups, and a phenolic-novolak polymer was used for producing an image which comprises providing on a substrate a layer of said composition imagewise exposing the layer of light-sensitive composition to imaging radiation in a desired pattern and developing the exposed layer, thereby leaving the desired pattern of the light sensitive positive resist composition remaining on the substrate.
Patent
Method of forming relief patterns and use thereof
Donis George Flagello,Michael Hatzakis,Noe Susan Cunningham,Jane Margaret Shaw,David F. Witman +4 more
TL;DR: A relief pattern is formed by exposing a portion of a photosensitive layer of polymeric material having reactive hydrogen functional groups and/or reactive hydrogen precursor groups to actinic light and then contacting the layer with a multifunctional organometallic material containing at least two functio-nal groups which are reactive with the reactive hydrogen groups of the polymeric materials as discussed by the authors.
Proceedings ArticleDOI
Organic transistors with low operating voltage and high mobility
Christos D. Dimitrakopoulos,S. Purushothaman,J. Kymissis,A. Callegari,Deborah A. Neumayer,P.R. Duncombe,R.B. Laibowitz,Jane Margaret Shaw +7 more
TL;DR: In this article, thin film transistors (TFTs) with pentacene as the semiconductor layer and an amorphous metal oxide gate insulator with a dielectric constant around 16 were fabricated and tested.