John S. Villarrubia

TL;DR: In this article, the authors applied hybrid metrology to sub-20 nm dense feature sets and showed reduced measurement uncertainties on 15 nm CD features and evaluated approaches to adapt quantitative hybrid metrologies into a high volume manufacturing environment.

TL;DR: Two stereophotogrammetry software packages need further improvement before they can be used reliably with SEM images with uniform zones, and in a sample containing nearly uniform and therefore low-contrast zones, the height reconstruction error was ≈46%.

TL;DR: In this paper, the stylus tip increases the profile peak width and decreases the measured valley width, which can cause either an increase or a decrease in the apparent roughness average Ra, depending on the tip size and the ratio of peak width to valley width.

TL;DR: Knight et al. as discussed by the authors discuss the current state of the art in the metrology for measuring critical dimensions of printed features for scanning electron microscopy and atomic force microscopy, and describe work at the National Institute of Standards and Technology advancing these tools as well as exploratory work on two new promising techniques.

TL;DR: Simulations with JMONSEL, an electron microscope simulator, indicate that the nanometer-scale differences observed on this sample can be explained by the different convolution effects of a beam with finite size on signals with different symmetry.