Richard M. Silver

TL;DR: In this article, the scanning tunneling microscope was used to write metallic features on a surface without further process steps, using organometallic gases to obtain features down to 20 nm in size.

TL;DR: In this paper, an electron beam evaporator is used to grow thin oxide superconductors on Si, Al2O3, and SrTiO3 substrates at a substrate temperature of 540°C without the need for annealing.

TL;DR: In this article, a comprehensive summary and analysis of a SEMATECH funded project to study the limits of optical critical dimension scatterometry (OCD) is presented, focusing on two primary elements: 1) the comparison, stability, and validity of industry models and 2) a comprehensive analysis of process stacks to evaluate the ultimate sensitivity and limitation of OCD.

TL;DR: This paper extends scatterfield microscopy methods to targets composed of features much denser than the conventional Rayleigh resolution criterion and presents both experimental results and optical simulations using different electromagnetic scattering packages to evaluate the ultimate sensitivity and extensibility of these techniques.

TL;DR: In this paper, an uncertainty analysis on a scatterometry measurement is performed for a 120 nm pitch grating, consisting of photoresist lines 120 nm high, 45 nm critical dimension, and 88° side wall angle, measured with a σ-spectroscopic rotating compensator ellipsometer.