scispace - formally typeset
J

Jorj I. Owen

Researcher at Forschungszentrum Jülich

Publications -  24
Citations -  516

Jorj I. Owen is an academic researcher from Forschungszentrum Jülich. The author has contributed to research in topics: Etching (microfabrication) & Texture (crystalline). The author has an hindex of 12, co-authored 24 publications receiving 493 citations. Previous affiliations of Jorj I. Owen include Brigham Young University.

Papers
More filters
Journal ArticleDOI

Chemical etching of zinc oxide for thin-film silicon solar cells.

TL;DR: A model that explains the etching behavior of ZnO depending on the structural material properties and etching agent is proposed and several approaches to modify the etch behavior through special preparation and etch steps are provided.
Journal ArticleDOI

Novel etching method on high rate ZnO:Al thin films reactively sputtered from dual tube metallic targets for silicon-based solar cells

TL;DR: In this article, a two-step etching method based on hydrofluoric acid was proposed to achieve a regular distribution of large craters with the feature size of 1-2μm in diameter and about 250nm in depth.
Journal ArticleDOI

Novel etch process to tune crater size on magnetron sputtered ZnO:Al

TL;DR: In this article, a novel chemical etch process based on aluminum-doped zinc oxide (ZnO:Al) is presented, which enables the modification of surface features through the etch itself, thus allowing the separate optimization of zinc oxide:Al deposition and texturization.
Journal ArticleDOI

Damp heat stable doped zinc oxide films

TL;DR: In this article, the authors investigated the damp heat stability of aluminum doped ZnO (ZnO:Al) films sputter deposited at different conditions, and proposed a grain boundary reconstruction model to explain the high stability of as-deposited zinc oxide films after annealing.
Journal ArticleDOI

Analyzing nanotextured transparent conductive oxides for efficient light trapping in silicon thin film solar cells

TL;DR: In this article, an approach to analyze random nanotextured surfaces by atomic force microscopy and image segmentation was developed to investigate sputtered and wet chemically etched aluminum doped zinc oxide films with various morphologies.