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New approaches to nanofabrication: molding, printing, and other techniques.

Boron carbide is characterized by a unique combination of properties that make it a material of choice for a wide range of engineering applications. Boron carbide is used in refractory applications due to its high melting point and thermal stability; it is used as abrasive powders and coatings due to its extreme abrasion resistance; it excels in ballistic performance due to its high hardness and low density; and it is commonly used in nuclear applications as neutron radiation absorbent. In addition, boron carbide is a high temperature semiconductor that can potentially be used for novel electronic applications. This paper provides a comprehensive review of the recent advances in understanding of structural and chemical variations in boron carbide and their influence on electronic, optical, vibrational, mechanical, and ballistic properties. Structural instability of boron carbide under high stresses associated with external loading and the nature of the resulting disordered phase are also discussed.

Boron Carbide: Structure, Properties, and Stability under Stress

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

All-dielectric nanophotonics is an exciting and rapidly developing area of nano-optics that utilizes the resonant behavior of high-index low-loss dielectric nanoparticles to enhance light–matter interaction at the nanoscale. When experimental implementation of a specific all-dielectric nanostructure is desired, two crucial factors have to be considered: the choice of a high-index material and a fabrication method. The degree to which various effects can be enhanced relies on the dielectric response of the chosen material as well as the fabrication accuracy. Here, we provide an overview of available high-index materials and existing fabrication techniques for the realization of all-dielectric nanostructures. We compare performance of the chosen materials in the visible and IR spectral ranges in terms of scattering efficiencies and Q factors of the magnetic Mie resonance. Methods for all-dielectric nanostructure fabrication are discussed and their advantages and disadvantages are highlighted. We also present an outlook for the search for better materials with higher refractive indices and novel fabrication methods that will enable low-cost manufacturing of optically resonant high-index nanoparticles. We believe that this information will be valuable across the field of nanophotonics and particularly for the design of resonant all-dielectric nanostructures.

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All-dielectric nanophotonics: the quest for better materials and fabrication techniques

We review the current status of liquid noble gas radiation detectors with energy threshold in the keV range, which are of interest for direct dark matter searches, measurement of coherent neutrino scattering and other low energy particle physics experiments. Emphasis is given to the operation principles and the most important instrumentation aspects of these detectors, principally of those operated in the double-phase mode. Recent technological advances and relevant developments in photon detection and charge readout are discussed in the context of their applicability to those experiments.

Liquid noble gas detectors for low energy particle physics

Self-consistent optical constants of SiO2 and Ta2O5 films have been obtained for their relevance in optical coatings from the near ultraviolet to the near infrared spectral ranges, where they are transparent and have a high refractive index contrast Particular attention has been paid to wavelengths close to and shorter than each material cutoff The far and the extreme ultraviolet ranges are also covered here, where few (SiO2) or almost no optical constant data (Ta2O5) were available for films of these materials This work is aimed at filling the lack of self-consistent sets of optical constants with data in a very broad spectral range, which can be widely applied in multilayer design for the everyday use of these materials in multilayer coatings Oxide films were deposited by reactive electron-beam evaporation onto various sorts of substrates at 573 K Transmittance, reflectance, and ellipsometry measurements were performed for each oxide in spectral intervals jointly covering from the extreme ultraviolet to the near infrared; starting with these measurements along with extrapolations, an iterative and double Kramers-Kronig analysis procedure has been followed to obtain a self-consistent set of optical constants per material With the final data sets, we have satisfactorily reproduced the experimental measurements Global data self-consistency was successfully evaluated through sum rules, and local consistency at each photon energy range was also evaluated through a novel sum-rule method which involves window functions

Self-consistent optical constants of SiO_2 and Ta_2O_5 films

The optical constants of ion-beam-sputtered SiC films have been measured by ellipsometry in the 190 to 950 nm range. The set of data has been extended both toward shorter and longer wavelengths with data in the literature, along with inter- and extrapolations, in order to obtain a self-consistent set of data by means of Kramers–Kronig analysis. All data correspond to films that were deposited by sputtering on nonheated substrates, and hence they are expected to be amorphous. A bandgap of 1.9 eV for the films was fitted from the obtained optical constants. A good global accuracy of the data was estimated through the use of various sum rules. The consistent dataset includes the visible to the extreme ultraviolet (EUV); this large spectrum of characterization will enable the design of multilayer coatings that combine a high reflectance in parts of the EUV with desired performance at a secondary range, such as the visible. To our knowledge, this paper provides the first compilation of the optical constants of amorphous SiC films.

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Self-consistent optical constants of SiC thin films

Various fluorides are materials in nature that extend their transparency range to the shortest wavelengths in the far ultraviolet (FUV, 100nm<λ<200 nm). These are relevant materials to prepare multilayer coatings in the FUV for demanding applications such as space instrumentation for astrophysics, solar physics and atmosphere physics, as well as free electron lasers, plasma diagnostics, synchrotron radiation, lithography, spectroscopy, etc. Multilayer design requires an optical constant of the coating materials. Multilayers optimally alternate two transparent materials with contrasting refractive indices. The optical constants of a low-index material, MgF2, and of two high-index materials, LaF3 and CeF3, have been determined in a wide spectral range and are presented here. Thin films of MgF2, LaF3, and CeF3 were deposited by boat evaporation onto substrates at 523 K. Transmittance, reflectance, and ellipsometry measurements were performed in ranges jointly covering the 30-950-nm spectral range. This range was extended with literature data and extrapolations to obtain self-consistent optical constants using the Kramers-Kronig (KK) analysis. An iterative, double KK analysis procedure (successive reflectance-phase and k-n KK analyses) was carried out to obtain a self-consistent set of optical constants per material. With the final data sets, the experimental measurements were satisfactorily reproduced. Global self-consistency of the data sets was successfully evaluated through sum rules; additionally, local self-consistency at each photon energy range was also evaluated through a novel sum-rule method which involves window functions. The new sets of optical constant extend the data availability mainly to the FUV and beyond, particularly for CeF3, where few data had been reported.

Self-consistent optical constants of MgF_2, LaF_3, and CeF_3 films

/pdf/self-consistent-optical-constants-of-mgf2-laf3-and-cef3-2ds9ynuvs7.pdf

Juan I. Larruquert

Papers

Self-consistent optical constants of SiO_2 and Ta_2O_5 films

Self-consistent optical constants of SiC thin films

Self-consistent optical constants of MgF_2, LaF_3, and CeF_3 films

Self-consistent optical constants of MgF2,LaF3, and CeF3 films

Far ultraviolet optical properties of MgF2 films deposited by ion-beam sputtering and their application as protective coatings for Al