Showing papers by "Jun Hatakeyama published in 1999"
Patent•
09 Sep 1999
TL;DR: In this paper, the problem of obtaining a compound useful as a monomer for obtaining a high polymer compound used as a base resin of a resist material, sensitive to a high energy ray, excellent in sensitivity, resolution and etching resistance and useful for a fine processing with an electron beam or a far ultraviolet ray was solved.
Abstract: PROBLEM TO BE SOLVED: To obtain the subject compound useful as a monomer for obtaining a high polymer compound used as a base resin of a resist material, sensitive to a high energy ray, excellent in sensitivity, resolution and etching resistance and useful for a fine processing with an electron beam or a far ultraviolet ray. SOLUTION: This lactone-containing compound is a compound of formula I [R1 is H, methyl, CH2COOR5 (R5 is a 1-18C alkyl); R2 is H, methyl or COOR5, R3 is a 1-8C alkyl; R4 is H or COOR5; X is CH2, CH2CH2, O or S], e.g. 5-oxo-4- oxatricyclo[4.2.1.03.7]nonane-2-yl methqcrylate. The compound of the formula I is obtained e.g. by performing an oxidation of a double bond accompanying with a lactone ring formation on a compound obtained by performing a Diels- Alder reaction of a compound of formula II with a compound of formula III, and further esterifying the obtained compound with a compound of formula IV. COPYRIGHT: (C)2000,JPO
88 citations
Patent•
28 Oct 1999
TL;DR: In this article, the authors proposed a new ester compound easily decomposable with an acid, useful as a raw material for a polymer compound realizing the sensitivity, resolution and etching resistance highly exceeding those of conventional product and effective as a resist material.
Abstract: PROBLEM TO BE SOLVED: To provide a new ester compound easily decomposable with an acid, useful as a raw material for a polymer compound realizing the sensitivity, resolution and etching resistance highly exceeding those of conventional product and effective as a resist material. SOLUTION: The objective compound is expressed by formula I (R1 is H, methyl, CH2CO2R14 or the like; R2 is H, methyl or CO2R14; R3 is a 1-8C alkyl or a 6-20C aryl; R4 to R13 are each H, a univalent hydrocarbon group or the like; R14 is a 1-15C alkyl), e.g. the compound of formula II. The objective compound can be produced by carrying out the nucleophilic addition reaction to the carbonyl group of bicyclo[2.2.1]heptan-2-one and its derivative by Grignard reaction, etc., to obtain an endo-type alcohol, subjecting the endo-type alcohol to a substitution reaction with an acid accompanying the inversion of steric structure and further carrying out the procedure of an alkali hydrolysis to form an exo-type alcohol, etc.
80 citations
Patent•
24 Sep 1999TL;DR: In this paper, a novel lactone-containing compound is provided as well as a polymer comprising units of the compound, which is used as a base resin to formulate a resist composition having a high sensitivity, resolution and etching resistance.
Abstract: A novel lactone-containing compound is provided as well as a polymer comprising units of the compound. The polymer is used as a base resin to formulate a resist composition having a high sensitivity, resolution and etching resistance.
35 citations
Patent•
27 Jan 1999
TL;DR: In this article, the authors proposed a positive resist composition using a high molecular compound obtained by putting a cross link having an acid cleavable tertiary ester skeleton between high molecular compounds which become alkali-soluble under an acid as a base resin.
Abstract: PROBLEM TO BE SOLVED: To attain high resolution by preparing a positive resist composition using a high molecular compound obtained by putting a cross link having an acid cleavable tertiary ester skeleton between high molecular compounds which become alkali-soluble under an acid as a base resin. SOLUTION: The positive resist composition contains (A) a high molecular compound obtained by cross linking resins which become alkali-soluble by reaction with an acid with an organic group having a tertiary ester structure and subjected to breaking of the link under the acid, (B) a radiation sensitive acid generating agent which generates the acid when irradiated and (C) an organic solvent. The structure of the cross linked organic group is represented by the formula, wherein X is a bonding part to the principal chain of a high molecular compound, R1 is 1-8C linear, branched or cyclic alkyl, R2 is H, 1-8C linear, branched or cyclic alkyl or optionally substituted phenyl, Y is a 1-20C (n+1)-valent hydrocarbon group which may contain an ether bond, (m) is 0 or 1 and (n) is a natural number of >=1.
13 citations
Patent•
20 Oct 1999
TL;DR: In this article, the base polymer for a chemical amplification negative type resist comprises a recurring unit represented by general formula (1) (wherein R1 is a 1-10C linear, branched or cyclic alkyl group in which the carbon atom directly bonded to the oxygen atom is primary or secondary).
Abstract: PROBLEM TO BE SOLVED: To obtain a chemical amplification negative type resist material having a high cross-linking efficiency and a high sensitivity. SOLUTION: This base polymer for a chemical amplification negative type resist comprises a recurring unit represented by general formula (1) (wherein R1 is a 1-10C linear, branched or cyclic alkyl group in which the carbon atom directly bonded to the oxygen atom is primary or secondary; R2 is hydrogen atom or a 1-10C linear, branched or cyclic alkyl group; m and n are each 0
6 citations
Patent•
02 Nov 1999