Showing papers by "Jun Hatakeyama published in 2017"
Patent•
26 Jan 2017
TL;DR: In this article, the material for a resist underlay film is used in lithography, and comprises a compound having an indenofluorene structure, which has excellent filling property, generates little outgas and has high heat resistance.
Abstract: PROBLEM TO BE SOLVED: To provide a material for a resist underlay film, which has excellent filling property, generates little outgas, and has high heat resistance.SOLUTION: The material for a resist underlay film is to be used in lithography, and comprises a compound having an indenofluorene structure.SELECTED DRAWING: None
3 citations
Patent•
26 Dec 2017TL;DR: In this paper, a bio-electrode composition capable of forming a living body contact layer for a bio electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction of conductivity even if wet with water or dried.
Abstract: PROBLEM TO BE SOLVED: To provide a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even if wet with water or dried.SOLUTION: The present invention provides a bio-electrode composition containing (A) an ionic material and (B) a resin other than the component (A), in which the component (A) has both a repeating unit a of a lithium salt, sodium salt, potassium salt or ammonium salt of a sulfonamide including a partial structure represented by the general formula (1) defined by -R-C(=O)-N-SO-RfMand a repeating unit b including silicon.SELECTED DRAWING: Figure 1
3 citations
Patent•
04 May 2017TL;DR: In this paper, a polymer comprising recurring units derived from vinylanthraquinone, acid labile group-substituted hydroxystyrene, and recurring unit derived from hydroxy styrene is provided.
Abstract: A polymer comprising recurring units derived from vinylanthraquinone, recurring units derived from acid labile group-substituted hydroxystyrene, and recurring units derived from hydroxystyrene is provided. The polymer is used as a base resin to formulate a positive resist composition having a high resolution and minimal LER.
1 citations
Patent•
07 Dec 2017
TL;DR: In this article, the authors proposed a pattern-forming method for a polymer with a high resolution exceeding that of conventional positive resist materials and also having a small line edge roughness, a positive resist material containing the same, and a pattern forming method using the same.
Abstract: PROBLEM TO BE SOLVED: To provide a polymer suitable as a base resin of a positive resist material having a high resolution exceeding that of conventional positive resist materials and also having a small line edge roughness, a positive resist material containing the same, and a pattern forming method using the same.SOLUTION: A polymer contains a repeating unit represented by the formula (a), a repeating unit represented by the formula (b), and a repeating unit represented by the formula (c), with a weight average molecular weight of 1,000-500,000 (where Ris an acid-labile group. Rand Rindependently represent a halogen atom, or a C1-C6 linear or branched alkyl group).SELECTED DRAWING: None
1 citations
Patent•
12 Dec 2017
TL;DR: In this paper, the authors describe a scenario where a person is confronted with a situation where he or she has to decide whether or not to respond to a message from another person.
Abstract: 【課題】導電性及び生体適合性に優れ、軽量であり、かつ低コストで製造することができ、水に濡れても乾燥しても導電性が大幅に低下することがない生体電極用の生体接触層を形成できる生体電極組成物を提供する。【解決手段】（Ａ）イオン性材料、及び（Ｂ）前記（Ａ）成分以外の樹脂を含有する生体電極組成物であって、前記（Ａ）成分が、下記一般式（１）で示される部分構造を有するスルホンアミドのリチウム塩、ナトリウム塩、カリウム塩、アンモニウム塩の繰り返し単位ａと、珪素を有する繰り返し単位ｂの両方を有するものである生体電極組成物。−Ｒ１−Ｃ（＝Ｏ）−Ｎ−−ＳＯ２−Ｒｆ１Ｍ＋（１）【選択図】図１
Patent•
09 Feb 2017
TL;DR: In this paper, the problem of providing a compound suitable as raw materials for polymer compounds suitably used as base resin for resist compositions having high resolution and high sensitivity and excellent in a balance of lithography performances such as LWR and CDU was solved.
Abstract: PROBLEM TO BE SOLVED: To provide a compound suitable as raw materials for polymer compounds suitably used as base resin for resist compositions having high resolution and high sensitivity and excellent in a balance of lithography performances such as LWR and CDU.SOLUTION: The present invention provides a compound represented by formula (1) (Ris H, F, a methyl group or a trifluoromethyl group; A is a single bond or a C1-30 bivalent hydrocarbon group optionally including a hetero atom; all or part of H in the hydrocarbon group is optionally substituted by a group including a hetero atom).SELECTED DRAWING: None