scispace - formally typeset
J

Jun Xu

Researcher at Nanjing University

Publications -  11
Citations -  212

Jun Xu is an academic researcher from Nanjing University. The author has contributed to research in topics: Amorphous solid & Quantum dot. The author has an hindex of 7, co-authored 10 publications receiving 201 citations.

Papers
More filters
Journal ArticleDOI

Structural and electronic properties of Si nanocrystals embedded in amorphous SiC matrix

TL;DR: In this article, a Si-rich hydrogenated amorphous silicon carbide thin films were prepared by plasma-enhanced chemical vapor deposition technique, and as-deposited films were subsequently annealed at 900 and 1000°C to form Si nanocrystals embedded in amorphized SiC matrix.
Journal ArticleDOI

Size-dependent electroluminescence from Si quantum dots embedded in amorphous SiC matrix

TL;DR: In this paper, size-dependent electroluminescence (EL) was observed, and the EL intensity was higher for the sample containing small-sized Si QDs due to the quantum confinement effect (QCE).
Journal ArticleDOI

Evaluation of microstructures and carrier transport behaviors during the transition process from amorphous to nanocrystalline silicon thin films

TL;DR: In this article, the microstructures and carrier transport behaviors were evaluated during the transition process from amorphous to nanocrystalline structures using Raman scattering and Fourier transform infrared spectroscopy.
Journal ArticleDOI

Light Trapping and Down‐Shifting Effect of Periodically Nanopatterned Si‐Quantum‐Dot‐Based Structures for Enhanced Photovoltaic Properties

TL;DR: In this paper, the authors used a nanosphere lithography technique to create periodically nanopatterned Si structures, which exhibit good anti-reflection and enhanced optical absorption characteristics, and the prototype n-Si/Si quantum dot/SiO2 multilayers/p-Si heterojunction solar cells were fabricated.
Journal ArticleDOI

Enhanced photovoltaic property by forming p-i-n structures containing Si quantum dots/SiC multilayers

TL;DR: Transmission electron microscopy observation revealed the formation of Si QDs after 900°C annealing and the p-i-n structure with n-a-Si/i-(Si QDs/SiC multilayers)/p-Si was fabricated, and the carrier transportation mechanism was investigated.