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Showing papers by "Jürgen H. Werner published in 1994"


Journal ArticleDOI
TL;DR: The theoretical upper limit for solar cell conversion efficiency can be raised if photon absorption and electron-hole excitation follow a specific pathway that includes photon absorption at specific points in the Brillouin zone, and an inverse Auger effect mechanism for the multiplication of electron- hole pairs.
Abstract: Quantum efficiencies of more than merely one electron-hole pair per absorbed photon have recently been demonstrated for solar cells. The theoretical upper limit for solar cell conversion efficiency can thus be raised (from 30%) to 43% if photon absorption and electron-hole excitation follow a specific pathway. This pathway includes photon absorption at specific points in the Brillouin zone, and an inverse Auger effect mechanism for the multiplication of electron-hole pairs. We specify the principles and rules for optimal band structure tailoring.

199 citations


Proceedings ArticleDOI
05 Dec 1994
TL;DR: In this article, a new surface passivation method using corona-charged oxides is discussed and applied to effective lifetime measurements by microwave-detected photoconductivity decay, which is required for evaluating surface recombination velocities and semiconductor bulk lifetimes in monocrystalline silicon wafers.
Abstract: A new surface passivation method using corona-charged oxides is discussed and applied to effective lifetime measurements by microwave-detected photoconductivity decay. Three lifetime measurements are required for evaluating surface recombination velocities and semiconductor bulk lifetimes in monocrystalline silicon wafers. Surface recombination velocities lower than 1 cm/s are achieved with corona passivation.

41 citations


Journal ArticleDOI
TL;DR: In this article, the authors present experimental evidence that this excessive photon energy can be utilized for the generation of a second electron/hole pair via an additional Auger-type generation.

33 citations


Journal ArticleDOI
TL;DR: In this paper, the authors used time-resolved microwave reflection measurements to monitor the carrier recombination in silicon wafers with a periodic metallization pattern on one surface.
Abstract: The effective minority carrier lifetime in semiconductors with recombination inhomogeneities depends on the spatial distribution of recombination sites and not only on their absolute number. We use time‐resolved microwave reflection measurements to monitor the carrier recombination in silicon wafers with a periodic metallization pattern on one surface. This contact scheme simulates the distribution of sites of enhanced carrier recombination. The experiments reveal a sensitive dependence of the effective minority carrier lifetime on the interdistance and the size—i.e., the scaling—of the metallization pattern at fixed metallization area ratio. This so‐called scaling effect occurs whenever the size and the interdistance of recombination sites are comparable to the minority carrier diffusion length. Our experiments are in good agreement with results from a new analytical three‐dimensional simulation which is based on the solution of the electronic transport equations in Fourier space. Our model is applicable...

31 citations


Proceedings ArticleDOI
05 Dec 1994
TL;DR: In this paper, it was shown that more than one electron/hole pair per absorbed photon can be created in a solar cell, which leads to new upper radiative efficiency limits for photovoltaic energy conversion.
Abstract: Quantum efficiency measurements showed that more than one electron/hole pair per absorbed photon can be created in a solar cell. Theoretical consideration of this effect leads to new upper radiative efficiency limits for photovoltaic energy conversion. More than 43% efficiency are theoretically possible for cells which are illuminated by the Sun's unconcentrated black body radiation. For sunlight of full concentration, the new limit is above 85%. These values are theoretically possible with a single semiconductor which makes efficient use of carrier multiplication. The theoretical description of radiative recombination in a cell with carrier multiplication leads us also to a novel mathematical description of the saturation current density.

27 citations


Journal ArticleDOI
TL;DR: Au/Sb films annealed at temperatures as low as 370 °C yield ohmic contacts to n-type Si as discussed by the authors, where the contact formation is based on a liquid phase epitaxy process of Sb-doped Si from Au solution.
Abstract: Au/Sb films annealed at temperatures as low as 370 °C yield ohmic contacts to n‐type Si. The contact formation is based on a liquid‐phase epitaxy process of Sb‐doped Si from Au solution. Measured contact resistivities range around 3×10−2 Ω cm2 and are at least one order of magnitude higher than what is expected from the solid solubility of Sb in Si. The discrepancy stems from local inhomogeneous etching and epitaxial regrowth of the (100)‐oriented Si surface by and from the Au solution. Only a small fraction of the macroscopic contact area is doped by Sb and contributes to current transport across the Au/Si(100) interface.

17 citations


Proceedings ArticleDOI
05 Dec 1994
TL;DR: In this paper, the authors report on the characterisation of epitaxial Si on Si substrates grown at temperatures around 450/spl deg/C as one prerequisite for crystalline Si deposition on low temperature resistant foreign substrates and describe two novel approaches aimed to produce large grained seeding films for subsequent polycrystalline si deposition on glass substrates.
Abstract: The authors report on the characterisation of epitaxial Si on Si substrates grown at temperatures around 450/spl deg/C as one prerequisite for crystalline Si deposition on low temperature resistant foreign substrates and describe two novel approaches aimed to produce large grained seeding films for subsequent polycrystalline Si deposition on glass substrates. A modified solution growth process at temperatures around 600-650/spl deg/C produces polycrystalline Si seeding films with grains laterally extending several 100 /spl mu/m on borosilicate glass substrates. In it second approach, the authors use polycrystalline /spl beta/-FeSi/sub 2/ films as a seed for Si deposition.

8 citations


Book ChapterDOI
01 Jan 1994
TL;DR: In this paper, the authors describe the Schottky contacts as a type of asymmetries in the transport of electrical current across metal/semiconductor interfaces and propose microscopic concepts to describe them.
Abstract: Experiments on rectifying contacts started in 1874 with the pioneering work of Braun who observed asymmetries in transport of electrical current across metal/semiconductor interfaces [3.1]. The following decades brought out a variety of technical applications, but it took more than sixty years until Schottky [3.2] and, independently, Mott [3.3] gave microscopic concepts to describe these so-called Schottky contacts. Today, in 1994, these interfaces are still not completely understood.

6 citations


Proceedings ArticleDOI
05 Dec 1994
TL;DR: In this article, the analysis of the internal quantum efficiency of monocrystalline silicon solar cells is extended to thin film cells on a highly doped substrate, and the implicit equations for the diffusion lengths of base and substrate are numerically and graphically solved.
Abstract: The analysis of internal quantum efficiency of monocrystalline silicon solar cells is extended to thin film cells on a highly doped substrate. Our model evaluates the internal quantum efficiency of cells in the limit of strong and weak absorption, i.e. for light with absorption lengths falling below and exceeding the base width of the cells. These two regimes yield two characteristic lengths, which allow one to distinguish between recombination within the epitaxial layer and into the substrate. The implicit equations for the diffusion lengths of base and substrate are numerically and graphically solved. In all cases, the evaluation gives limiting values. For the special case of thin film silicon solar cells, we are able to determine the substrate diffusion length with high accuracy. For the base diffusion length we deduce a lower bound.

3 citations