K
K. Murakami
Researcher at Tokyo University of Science
Publications - 2
Citations - 119
K. Murakami is an academic researcher from Tokyo University of Science. The author has contributed to research in topics: Semiconductor & Ultimate tensile strength. The author has an hindex of 1, co-authored 1 publications receiving 109 citations.
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Band gap energies of bulk, thin-film, and epitaxial layers of CuInSe2 and CuGaSe2
Shigefusa F. Chichibu,Shigefusa F. Chichibu,T. Mizutani,K. Murakami,T. Shioda,T. Kurafuji,Hachiro Nakanishi,S. Niki,Paul Fons,Akimasa Yamada +9 more
TL;DR: In this article, the band gap and excitonic resonance energies of high-quality bulk single crystals, polycrystalline thin films, and epitaxial layers of CuInSe2 and CuGaSe2 were determined as a function of temperature by means of photoreflectance, optical absorption (OA), and photoluminescence measurements.
Journal ArticleDOI
Improving bonding strength of Al/CFRTP hybrid joint through modifying friction spot joining tools
Peihao Geng,Hong Ma,Weihao Li,K. Murakami,Qian Wang,Ninshu Ma,Yasuhiro Aoki,Hidetoshi Fujii,Chuantong Chen +8 more
TL;DR: In this article , the feasibility of tool modification to improve the property of the silane-coated 6061-T6 Al alloy and carbon fiber-reinforced polyamide-6 (CF/PA6) FSpJ joint was investigated and compared.