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K

K. Schmidt

Researcher at Forschungszentrum Jülich

Publications -  6
Citations -  241

K. Schmidt is an academic researcher from Forschungszentrum Jülich. The author has contributed to research in topics: Sputtering & Nanoindenter. The author has an hindex of 6, co-authored 6 publications receiving 240 citations.

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Elastic constants and hardness of ion-beam-sputtered tinx films measured by brillouin scattering and depth-sensing indentation

TL;DR: In this paper, a wide range of stoichiometries, 0≤x≤0.8, was extended to include a wide variety of stochastic properties.
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Characterization of metal-containing amorphous hydrogenated carbon films

TL;DR: In this article, metal-containing amorphous hydrogenated carbon (Me-C: H) films were prepared on silicon substrates and the mechanical properties, i.e., microhardness, Young's modulus, and adhesion, were measured with the help of a nanoindenter and scratch tester.
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Mechanical properties of a‐Si:H films studied by Brillouin scattering and nanoindenter

TL;DR: In this article, a series of aSi:H films has been prepared by rf sputtering in a H2-Ar gas mixture, where the hydrogen portion of the gas mixture was changed from 0% to 20% and the shear modulus was measured by the frequency of the surface phonon (Rayleigh wave).
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The properties of W–C:H films deposited by reactive rf sputtering

TL;DR: In this paper, tungsten-containing amorphous hydrogenated carbon (W-C:H) films were prepared on silicon substrates by reactive rf sputtering (13.56 MHz). Elastic recoil detection (ERD) and Rutherford backscattering of MeV He+ ions have been performed to determine the hydrogen concentration and mass density of the films, respectively.
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Hardness and Young's modulus of diamond-like carbon films prepared by ion beam methods

TL;DR: Amorphous diamond-like carbon films were prepared in a dual ion beam facility equipped with two Kaufmann sources of 3 cm diameter and of a maximum beam voltage of 1500 eV as discussed by the authors.