K
Kazuhiro Tanaka
Researcher at Fujitsu
Publications - 70
Citations - 747
Kazuhiro Tanaka is an academic researcher from Fujitsu. The author has contributed to research in topics: Optical interconnect & Quantum well. The author has an hindex of 14, co-authored 70 publications receiving 734 citations.
Papers
More filters
Patent
Optical transmission terminal device
TL;DR: In this article, an optical transmission terminal device including a printed wiring board and an optical module mounted on the printed wires board is described. And the optical module includes an optical component mounting substrate, a photoelectric converter mounted on a substrate, and a first optical fiber having one end optically coupled to the photonic converter and a ferrule mounting on the substrate so as to partially project from the substrate.
Patent
Ferrule assembly and optical module
TL;DR: In this article, an optical module including a substrate having a groove, an optical waveguide layer formed on the substrate, and an optical fiber inserted and fixed in the through hole is described.
Journal ArticleDOI
Advanced LiNbO/sub 3/ optical modulators for broadband optical communications
TL;DR: In this paper, advanced lithium niobate (LiNbO3) optical modulators for broadband optical communications are described, including 40-Gb/s ultralow voltage modulators, compact modulators and modulators with frequency comb generator and short pulse generation.
Proceedings ArticleDOI
8.9 A 40Gb/s VCSEL over-driving IC with group-delay-tunable pre-emphasis for optical interconnection
TL;DR: A new 2-tap pre-emphasis circuit with tunable group-delay compensation is presented that compensates for the complex group delay of VCSELs and achieves 40Gb/s low-jitter operation with 2.3dBm OMA and reduces the power consumption to as low as 312mW/ch.
Journal ArticleDOI
Semi‐insulator‐embedded InGaAsP/InP flat‐surface buried heterostructure laser
TL;DR: In this article, a new structure semi-insulator embedding flat surface buried heterostructure 1.3 μm InGaAsP/InP laser has been developed using chloride vapor phase epitaxy.