An object is to provide a semiconductor device of which a manufacturing process is not complicated and by which cost can be suppressed, by forming a thin film transistor using an oxide semiconductor film typified by zinc oxide, and a manufacturing method thereof. For the semiconductor device, a gate electrode is formed over a substrate; a gate insulating film is formed covering the gate electrode; an oxide semiconductor film is formed over the gate insulating film; and a first conductive film and a second conductive film are formed over the oxide semiconductor film. The oxide semiconductor film has at least a crystallized region in a channel region.

Semiconductor device, and manufacturing method thereof

This paper presents the current state of understanding of the factors that limit the continued scaling of Si complementary metal-oxide-semiconductor (CMOS) technology and provides an analysis of the ways in which application-related considerations enter into the determination of these limits. The physical origins of these limits are primarily in the tunneling currents, which leak through the various barriers in a MOS field-effect transistor (MOSFET) when it becomes very small, and in the thermally generated subthreshold currents. The dependence of these leakages on MOSFET geometry and structure is discussed along with design criteria for minimizing short-channel effects and other issues related to scaling. Scaling limits due to these leakage currents arise from application constraints related to power consumption and circuit functionality. We describe how these constraints work out for some of the most important application classes: dynamic random access memory (DRAM), static random access memory (SRAM), low-power portable devices, and moderate and high-performance CMOS logic. As a summary, we provide a table of our estimates of the scaling limits for various applications and device types. The end result is that there is no single end point for scaling, but that instead there are many end points, each optimally adapted to its particular applications.

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Device scaling limits of Si MOSFETs and their application dependencies

A very high density field programmable memory is disclosed. An array is formed vertically above a substrate using several layers, each layer of which includes vertically fabricated memory cells. The cell in an N level array may be formed with N+1 masking steps plus masking steps needed for contacts. Maximum use of self alignment techniques minimizes photolithographic limitations. In one embodiment the peripheral circuits are formed in a silicon substrate and an N level array is fabricated above the substrate.

Vertically-stacked, field-programmable, nonvolatile memory and method of fabrication

Memory isolation is a key property of a reliable and secure computing system--an access to one memory address should not have unintended side effects on data stored in other addresses. However, as DRAM process technology scales down to smaller dimensions, it becomes more difficult to prevent DRAM cells from electrically interacting with each other. In this paper, we expose the vulnerability of commodity DRAM chips to disturbance errors. By reading from the same address in DRAM, we show that it is possible to corrupt data in nearby addresses. More specifically, activating the same row in DRAM corrupts data in nearby rows. We demonstrate this phenomenon on Intel and AMD systems using a malicious program that generates many DRAM accesses. We induce errors in most DRAM modules (110 out of 129) from three major DRAM manufacturers. From this we conclude that many deployed systems are likely to be at risk. We identify the root cause of disturbance errors as the repeated toggling of a DRAM row's wordline, which stresses inter-cell coupling effects that accelerate charge leakage from nearby rows. We provide an extensive characterization study of disturbance errors and their behavior using an FPGA-based testing platform. Among our key findings, we show that (i) it takes as few as 139K accesses to induce an error and (ii) up to one in every 1.7K cells is susceptible to errors. After examining various potential ways of addressing the problem, we propose a low-overhead solution to prevent the errors

/pdf/flipping-bits-in-memory-without-accessing-them-an-3dirvwezou.pdf

Flipping bits in memory without accessing them: an experimental study of DRAM disturbance errors

Three-dimensional integration enables stacking memory directly on top of a microprocessor, thereby significantly reducing wire delay between the two. Previous studies have examined the performance benefits of such an approach, but all of these works only consider commodity 2D DRAM organizations. In this work, we explore more aggressive 3D DRAM organizations that make better use of the additional die-to-die bandwidth provided by 3D stacking, as well as the additional transistor count. Our simulation results show that with a few simple changes to the 3D-DRAM organization, we can achieve a 1.75x speedup over previously proposed 3D-DRAM approaches on our memory-intensive multi-programmed workloads on a quad-core processor. The significant increase in memory system performance makes the L2 miss handling architecture (MHA) a new bottleneck, which we address by combining a novel data structure called the Vector Bloom Filter with dynamic MSHR capacity tuning. Our scalable L2 MHA yields an additional 17.8% performance improvement over our 3D-stacked memory architecture.

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3D-Stacked Memory Architectures for Multi-core Processors

An arrangement for providing a compensation of capacitance coupling between word lines and bit lines in a memory structure including twisted bit lines. Two dummy word lines maintained at a predetermined potential are formed at a twisted portion of a pair of bit lines. Dummy cells are provided at respective twisted portions of the dummy word lines and the bit lines. A plurality of word lines are formed in a direction intersecting with the bit lines and the word lines are divided into four word line groups according to positions of the twisted portions of the bit line pairs. When an arbitrary word line is selected, a potential of at least one dummy word line corresponding to the word line group to which the selected word line belongs is lowered. Consequently, the rise of the potential of the bit lines caused by the selection of the word line is compensated for by the lowering of the potential of at least one dummy word line, making it possible to decrease errors in reading. Particular cell layer arrangements simplify increase in integration density in the combination of dummy cell compensation with the twisted bit line balancing of capacitance coupling.

Dynamic semiconductor memory device of a twisted bit line system having improved reliability of readout

A semiconductor memory device comprises a DRAM memory cell array comprising a plurality of dynamic type memory cells arranged in a plurality of rows and columns, and an SRAM memory cell array comprising static type memory cells arranged in a plurality of rows and columns. The DRAM memory cell array is divided into a plurality of blocks each comprising a plurality of columns. The SRAM memory cell array is divided into a plurality of blocks each comprising a plurality of columns, corresponding to the plurality of blocks in the DRAM memory cell array. The SRAM memory cell array is used as a cache memory. At the time of cache hit, data is accessed to the SRAM memory cell array. At the time of cache miss, data is accessed to the DRAM memory cell array. On this occasion, data corresponding to one row in each of the blocks in the DRAM memory cell array is transferred to one row in the corresponding block in the SRAM memory cell array.

Semiconductor memory device for simple cache system

As the memory cell array of DRAM has been scaled down, inter-bit-line coupling noise has emerged as a serious problem. The signal loss due to this noise is estimated at about 40% of the signal amplitude in a polycide-bit-line 16-Mb DRAM with a technologically attainable scaling scheme. Twisted bit-line architectures to reduce or eliminate the noise are proposed and demonstrated by the soft-error rate improvement of a 1-Mb DRAM. The effective critical charge is improved by 35%, which is attributed not only to the improvement of the signal amplitude but also to the elimination of large coupling noise during the sensing operation. The impact of these twisted bit-line architectures from a scaling viewpoint is also examined, and they are shown to be promising candidates for overcoming the scaling problems of DRAMs. >

Twisted bit-line architectures for multi-megabit DRAMs

A dynamic random access memory with a fast serial access mode for use in a simple cache system includes a plurality of memory cell blocks prepared by division of a memory cell array, a plurality of data latches each provided for each column in the memory cell blocks and a block selector. When a cache miss signal is produced by the cache system, data on the column in the cell block selected by the block decoder are transferred into the data latches provided for the columns in the selected block after selection. When a cache hit signal is produced by the cache system, the data latches are isolated from the memory cell array. Accessing is made to at least one of the data latches based on an externally applied column address on cache hit, and to at least one of the columns in the selected block based on the column address on cache miss.

Cache contained type semiconductor memory device and operating method therefor

A DRAM for use in a simple cache memory system comprises a memory cell array divided into a plurality of blocks, a plurality of data registers provided corresponding to the respective blocks of the array for latching memory cell data of the corresponding blocks, and a selector responsive to a row address strobe signal for selecting access to either the data registers or the memory cell array. Upon cache hit, the row address strobe signal is inactivated to cause the selector to select the access to the data registers. Upon cache miss, the row address strobe signal is activated to cause the selector to select the access to the memory cell array.

Kazuyasu Fujishima

Papers

Dynamic semiconductor memory device of a twisted bit line system having improved reliability of readout

Semiconductor memory device for simple cache system

Twisted bit-line architectures for multi-megabit DRAMs

Cache contained type semiconductor memory device and operating method therefor

Semiconductor memory device containing a cache and an operation method thereof