K
Khurram Zafar
Researcher at KLA-Tencor
Publications - 7
Citations - 603
Khurram Zafar is an academic researcher from KLA-Tencor. The author has contributed to research in topics: Semiconductor device fabrication & Maxima. The author has an hindex of 5, co-authored 7 publications receiving 603 citations.
Papers
More filters
Patent
Methods and systems for utilizing design data in combination with inspection data
TL;DR: In this paper, a computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space.
Patent
Determining Design Coordinates for Wafer Defects
TL;DR: In this article, a method for determining design coordinates for defects detected on a wafer is described. But the alignment of a design to defect review tool images is not considered. But it is possible to align a design with defect review tools and determine a position of each defect in design coordinates based on the alignment.
Patent
Pattern weakness and strength detection and tracking during a semiconductor device fabrication process
Khurram Zafar,Chenmin Hu,Ye Chen,Yue Ma,Chingyun Hsiang,Justin Chen,Raymond Xu,Abhishek Vikram,Ping Zhang +8 more
TL;DR: In this article, a pattern tracking database is updated with information pertaining to at least one pattern in the one or more patterns generated as a result of the decomposition of a reference design.
Patent
Pattern centric process control
Chenmin Hu,Khurram Zafar,Ye Chen,Yue Ma,Lv Rong,Justin Chen,Abhishek Vikram,Yuan Xu,Ping Zhang +8 more
TL;DR: In this article, a layout of a semiconductor chip is decomposed into a plurality of intended circuit layout patterns, and a corresponding plurality of sets of fabrication risk assessments corresponding to respective ones of a pluralityof sources is determined.
Patent
Region based virtual fourier filter
Lisheng Gao,Kenong Wu,Allen Park,Ellis Chang,Khurram Zafar,Junqing Huang,Gu Ping,Chris Maher,Chen Grace H,Songnian Rong,Liu-Ming Wu +10 more
TL;DR: In this paper, the authors proposed a method to identify one or more patterned regions on a semiconductor wafer, and then generate a virtual Fourier filter (VFF) working area for each of these regions.