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Chingyun Hsiang
Publications - 6
Citations - 41
Chingyun Hsiang is an academic researcher. The author has contributed to research in topics: Mask inspection & Photolithography. The author has an hindex of 3, co-authored 6 publications receiving 39 citations.
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Patent
Pattern weakness and strength detection and tracking during a semiconductor device fabrication process
Khurram Zafar,Chenmin Hu,Ye Chen,Yue Ma,Chingyun Hsiang,Justin Chen,Raymond Xu,Abhishek Vikram,Ping Zhang +8 more
TL;DR: In this article, a pattern tracking database is updated with information pertaining to at least one pattern in the one or more patterns generated as a result of the decomposition of a reference design.
Proceedings ArticleDOI
Simulation based mask defect repair verification and disposition
Eric Guo,Shirley Zhao,Skin Zhang,Sandy Qian,Guojie Cheng,Abhishek Vikram,Ling Li,Ye Chen,Chingyun Hsiang,Gary Zhang,Bo Su +10 more
TL;DR: In this paper, a software tool called SMDD-Simulation based Mask Defect Disposition (SMDD) is used to extract edges from the mask SEM images and convert them into polygons to save in the GDSII format.
Proceedings ArticleDOI
Enhanced photomask quality control by 2D structures monitoring using auto image-to-layout method on advanced 28nm technology node or beyond
Eric Guo,Irene Shi,Eric Tian,Chingyun Hsiang,Guojie Cheng,Li Ling,Shijie Chen,Ye Chen,Ke Zhou,Joanne Wu,Kechih Wu +10 more
TL;DR: A novel 2D structure mask error monitoring technique is introduced to prevent fatal wafer printing errors such as CD error, line-end pull back and other pattern distortions to ensure high quality mask manufacturing and to improve wafer yield in advanced technology nodes.
Proceedings ArticleDOI
Simulation Based Mask Defect Printability Verification and Disposition, Part II
Eric Guo,Irene Shi,Blade Gao,Nancy Fan,Guojie Cheng,Li Ling,Ke Zhou,Gary Zhang,Ye Chen,Chingyun Hsiang,Bo Su +10 more
TL;DR: In this article, the authors reported simulation mask defect printability check and disposition results extending beyond SEM mask defect images into optical inspection mask defects images to demonstrate cost and time reduction by simulation in mask defect management area.
Proceedings ArticleDOI
Automatically high accurate and efficient photomask defects management solution for advanced lithography manufacture
Zhu Jun,Chen Lijun,Lantao Ma,Li Dejian,Wei Jiang,Lihong Pan,Huiting Shen,Jia Hongmin,Chingyun Hsiang,Guojie Cheng,Li Ling,Shijie Chen,Jun Wang,Wenkui Liao,Gary Zhang +14 more
TL;DR: In this article, the authors focus on automatic defect management and classification solution using image output of Lasertec inspection equipment and Anchor pattern centric image process technology, which can handle large number defects with quick and accurate defect classification result.