A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.

193nm laser and inspection system

An improved laser uses a pump laser with a wavelength near 1109 nm and a fundamental wavelength near 1171 nm to generate light at a wavelength between approximately 189 nm and approximately 200 nm, e.g. 193 nm. The laser mixes the 1109 nm pump wavelength with the 5 th harmonic of the 1171 nm fundamental, which is at a wavelength of approximately 234.2 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.

193 nm laser and an inspection system using a 193 nm laser

A DUV laser includes an optical bandwidth filtering device, such as etalon, which is disposed outside of the laser oscillator cavity of the fundamental laser, and which directs one range of wavelengths into one portion of a frequency conversion chain and another range of wavelengths into another portion of the frequency conversion train, thereby reducing the bandwidth of the DUV laser output while maintaining high conversion efficiency in the frequency conversion chain.

System and method for reducing the bandwidth of a laser and an inspection system and method using a laser

An exemplary illumination source for an inspection system includes a pulsed seed laser having a wavelength of approximately 1104 nm and a continuous wave, Raman seed laser having a wavelength of approximately 1160 nm. An optical coupler can combine outputs of the pulsed seed laser and the continuous wave, Raman seed laser. Pre-amplification stages can receive an output of the optical coupler. A power amplifier can receive an output of the pre-amplification stages. A sixth harmonic can be generated using the amplified, combined wavelength. Systems for inspecting a specimen such as a reticle, photomask or wafer can include one of the illumination sources described herein.

Solid state illumination source and inspection system

A laser device includes: a laser light source which generates a laser light in a pulse waveform of preset predetermined frequency; intensity modulator which is driven with a transmittance waveform wherein transmittance changes at either the predetermined frequency or an integer-multiple frequency thereof and which extracts and outputs the laser light which is outputted from the laser light source; control unit which controls an operation of the intensity modulator; an amplifier which amplifies the laser light which is outputted from the intensity modulator; and a wavelength conversion optical element which converts a wavelength of the laser light which is amplified by the amplifier, wherein the control unit changes relative timing of the transmittance waveform with respect to the pulse waveform, thereby changing the pulse waveform of the laser light which is emitted from the intensity modulator, to output a pulse light of predetermined waveform from the wavelength conversion optical element.

Laser device, and exposure device and inspection device provided with laser device

PROBLEM TO BE SOLVED: To provide a laser light source which can be operated at room temperature and is capable of efficiently generate deep ultraviolet rays and to provide a mask inspection device and an exposure device which have a high defect detection sensitivity due to this deep ultraviolet laser light source and are small-sized and stable SOLUTION: The deep ultraviolet light source includes; a solid laser which emits laser light having a wavelength of 090 to 092μm; a fourth higher harmonic generation part which generates the fourth higher harmonic of the laser light having the wavelength of 090 to 092μm, which is taken out from the solid laser; and a sum frequency generation part which generates light having a sum frequency of the fourth higher harmonic generated by the fourth higher harmonic generation part and laser light having a wavelength of 13μm COPYRIGHT: (C)2007,JPO&INPIT

Kiwamu Takehisa

Papers

Deep ultraviolet light source, mask inspection device using same, and exposure device